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机译:通过原位膜表征和等离子体诊断评估多孔SiOCH介质上H_2 / N_2等离子体损伤
Department of Electrical Engineering & Computer Science, Nagoya University, Nagoya 464-8603, Japan;
Department of Electrical Engineering & Computer Science, Nagoya University, Nagoya 464-8603, Japan;
Department of Electrical Engineering & Computer Science, Nagoya University, Nagoya 464-8603, Japan Plasma Nanotechnology Research Center, Nagoya University, Nagoya 464-8603, Japan;
Department of Electrical & Electronic Engineering, Meijo University 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan;
Plasma Nanotechnology Research Center, Nagoya University, Nagoya 464-8603, Japan;
Department of Electrical Engineering & Computer Science, Nagoya University, Nagoya 464-8603, Japan Plasma Nanotechnology Research Center, Nagoya University, Nagoya 464-8603, Japan;
Process & Manufacturing Engineering Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan;
Process & Manufacturing Engineering Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan;
Process & Manufacturing Engineering Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan;
Process & Manufacturing Engineering Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan;
机译:H_2和H_2 / N_2等离子体对多孔SiOCH薄膜化学键改性的原位红外反射吸收光谱研究
机译:还原性N_2 / H_2等离子体对多孔低介电常数SiCOH薄膜的影响
机译:等离子体对多孔低介电常数Cvd Sioch薄膜的影响
机译:用原位测量系统评估多孔SiOCH薄膜的等离子体损伤机理和性能和绝对自由基密度
机译:介电膜的等离子体诊断和表征。
机译:介电势垒放电沉积的等离子体聚合a-C:H薄膜的光谱研究
机译:使用无氧碳氟化合物等离子体将等离子体损伤和超低k介电薄膜的原位密封降至最低
机译:用电弧喷射等离子体沉积金刚石薄膜及等离子体表面区域诊断测量的最新结果