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Light extraction efficiency improvement and strain relaxation in InGaN/GaN multiple quantum well nanopillars

机译:InGaN / GaN多量子阱纳米柱的光提取效率提高和应变松弛

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摘要

Light extraction efficiency improvement and strain relaxation were observed in InGaN/GaN multiple quantum well (MQW) nanopillars. InGaN/GaN MQW-based LED nanopillar arrays with different diameters varying from about 120 to 250 nm were fabricated via inductively coupled plasma etching using Ni self-assembled nanodots as etching mask. The ray trace method and TiberCAD were used to calculate the light extraction efficiency and strain relaxation in the nanopillars. Remarkably improved light extraction efficiency and strain relaxation were obtained from the calculation results in the nanopillar structures.
机译:在InGaN / GaN多量子阱(MQW)纳米柱中观察到光提取效率的提高和应变松弛。通过使用Ni自组装纳米点作为刻蚀掩模的电感耦合等离子体刻蚀,制造了直径从120到250 nm不等的InGaN / GaN MQW基LED纳米柱阵列。使用射线追踪法和TiberCAD计算纳米柱中的光提取效率和应变松弛。从纳米柱结构的计算结果可以明显提高光提取效率和应变松弛。

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  • 来源
    《Journal of Applied Physics》 |2011年第2期|p.084339.1-084339.5|共5页
  • 作者单位

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductor, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, People's Republic of China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductor, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, People's Republic of China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductor, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, People's Republic of China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductor, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, People's Republic of China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductor, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, People's Republic of China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductor, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, People's Republic of China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductor, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, People's Republic of China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductor, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, People's Republic of China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductor, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, People's Republic of China Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215123, People's Republic of China;

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