首页> 外文期刊>Journal of Applied Physics >Critical thickness for extrinsic contributions to the dielectric and piezoelectric response in lead zirconate titanate ultrathin films
【24h】

Critical thickness for extrinsic contributions to the dielectric and piezoelectric response in lead zirconate titanate ultrathin films

机译:外部厚度对钛酸锆钛酸铅超薄膜中介电和压电响应的贡献的临界厚度

获取原文
获取原文并翻译 | 示例
       

摘要

Highly (100)-textured Pb(Zr_(0.53)Ti_(0.47))O_3 films (Lotgering factors ≥9O%) with thicknesses ranging from 20 to 260 nm were grown on platinized Si substrates using sol-gel deposition. Ferroelectric hysteresis, low field dielectric permittivity, and nonlinear dielectric response as well as converse longitudinal piezoelectric response (d_(33f)) of the ultrathin films were studied at 1 kHz. The measurements revealed the existence of a critical film thickness, ~50 nm, below which the extrinsic contributions to the dielectric response are almost completely suppressed. Piezoelectric response of the films also showed a significant (~50%) drop at the same critical thickness. Due to the columnar microstructure of these films the critical dimension of the ferroelectric is represented by the thickness rather than the lateral grain size, where the latter is invariant across the samples. The critical thickness led also to a deviation of the thickness dependence of the dielectric permittivity from the in-series capacitors model frequently representing "interfacial dead layers." The critical size is attributed to significant reduction in domain wall population and/or mobility in films thinner than ~50 nm.
机译:使用溶胶-凝胶沉积法在镀铂的Si衬底上生长厚度范围为20至260 nm的高度(100)织构化的Pb(Zr_(0.53)Ti_(0.47))O_3薄膜(Lotgering因子≥9O%)。研究了超薄膜在1 kHz时的铁电磁滞,低场介电常数和非线性介电响应以及反向纵向压电响应(d_(33f))。测量结果表明存在一个临界膜厚度,约为50 nm,在该厚度以下,几乎完全抑制了外在因素对介电响应的影响。在相同的临界厚度下,薄膜的压电响应也显示出明显的下降(〜50%)。由于这些薄膜的柱状微观结构,铁电体的临界尺寸由厚度而不是横向晶粒尺寸表示,横向晶粒尺寸在整个样品中不变。临界厚度还导致介电常数的厚度依赖性与通常代表“界面死层”的串联电容器模型的偏差。临界尺寸归因于在小于约50 nm的薄膜中畴壁的数量和/或迁移率的显着降低。

著录项

  • 来源
    《Journal of Applied Physics》 |2011年第1期|p.014115.1-014115.8|共8页
  • 作者单位

    G.W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology,Atlanta, Georgia 30332, USA;

    aixACCT Systems GmbH, D-52068 Aachen, Germany;

    aixACCT Systems GmbH, D-52068 Aachen, Germany;

    G.W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology,Atlanta, Georgia 30332, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号