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首页> 外文期刊>Journal of Applied Physics >Chemical vapor deposition of polycrystalline Fe_3O_4 thin films by using the cyclohexadiene iron tricarbonyl liquid precursor
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Chemical vapor deposition of polycrystalline Fe_3O_4 thin films by using the cyclohexadiene iron tricarbonyl liquid precursor

机译:环己二烯三羰基铁液态前驱体化学气相沉积多晶Fe_3O_4薄膜

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摘要

Magnetite (Fe_3O_4) thin films are synthesized by chemical vapor deposition (CVD) with the cyclohexadiene iron tricarbonyl Fe(C_6H_8)(CO)_3 liquid precursor. The growth of pure, polycrystalline, and stoichiometric Fe_3O_4 films is confirmed by X-ray diffraction, Raman spectroscopy, time-of-fiight secondary ion mass spectrometry, and conversion electron Moessbauer spectroscopy. At 297 K, the resistivity for 24.8 nm (100 nm) Fe_3O_4 thin film is 17 × 10~(-3) Ωcm (4.2 × 10~(-3) Ωcm), indicating the good electrical quality of the as-deposited layers. Magnetoresistance (MR) up to -2.2% is measured at 297 K at 1.1 T, corresponding to 15% electron spin polarization. A gradual increase of MR is observed at low temperature. In particular, the observed MR = -4.4% at 120 K (at 0.8 T) is attributed to an intrinsic enhancement of the electrons spin polarization up to 21.5%.
机译:用环己二烯三羰基铁Fe(C_6H_8)(CO)_3液态前驱体通过化学气相沉积(CVD)合成磁铁矿(Fe_3O_4)薄膜。通过X射线衍射,拉曼光谱,飞行时间二次离子质谱和转换电子Moessbauer光谱确认了纯的,多晶的和化学计量的Fe_3O_4薄膜的生长。在297 K时,24.8 nm(100 nm)Fe_3O_4薄膜的电阻率为17×10〜(-3)Ωcm(4.2×10〜(-3)Ωcm),表明沉积层的电性能良好。在297 K,1.1 T下测得的磁阻(MR)高达-2.2%,对应于15%的电子自旋极化。在低温下观察到MR逐渐增加。特别地,在120 K(在0.8 T时)观察到的MR = -4.4%归因于电子自旋极化的固有增强,最高可达21.5%。

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  • 来源
    《Journal of Applied Physics》 |2012年第2期|p.07B107.1-07B107.3|共3页
  • 作者单位

    Laboratorio MDM IMM-CNR, 1-20864 Agrate Brianza (MB), Italy;

    Laboratorio MDM IMM-CNR, 1-20864 Agrate Brianza (MB), Italy;

    Laboratorio MDM IMM-CNR, 1-20864 Agrate Brianza (MB), Italy;

    Laboratorio MDM IMM-CNR, 1-20864 Agrate Brianza (MB), Italy;

    Laboratorio MDM IMM-CNR, 1-20864 Agrate Brianza (MB), Italy;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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