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ZnO/(ZnMg)O single quantum wells with high Mg content graded barriers

机译:具有高镁含量梯度势垒的ZnO /(ZnMg)O单量子阱

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摘要

ZnO/Zn_(1-x)Mg_xO single quantum wells (SQWs) were grown by plasma-assisted molecular beam epitaxy on c-plane sapphire substrates. Compositional grading allows the application of optimized growth conditions for the fabrication of Zn_(1-x)Mg_xO barriers with high crystalline quality and a maximum Mg content of x = 0.23. High resolution x-ray diffraction reveals partial relaxation of the graded barriers. Due to exciton localization, the SQW emission is found to consist of contributions from donor-bound and free excitons. While for narrow SQWs with well width dw ≤ 2.5 nm, the observed increase of the exciton binding energy is caused by quantum confinement, the drop of the photoluminescence emission below the ZnO bulk value found for wide SQWs is attributed to the quantum-confined Stark effect. For a Mg content of x = 0.23, a built-in electric field of 630kV/cm is extracted, giving rise to a decrease of the exciton binding energy and rapid thermal quenching of the SQW emission characterized by an activation energy of (24 ± 4) meV for d_w = 8.3 nm.
机译:通过等离子辅助分子束外延在c面蓝宝石衬底上生长ZnO / Zn_(1-x)Mg_xO单量子阱(SQW)。成分分级允许应用优化的生长条件来制造具有高晶体质量和最大Mg含量x = 0.23的Zn_(1-x)Mg_xO势垒。高分辨率X射线衍射揭示了梯度阻挡层的部分松弛。由于激子的局限性,SQW的发射被发现是受捐助者约束和自由激子的贡献。对于阱宽dw≤2.5 nm的窄SQW,观察到的激子结合能的增加是由量子限制引起的,对于宽SQW,发现的低于ZnO体积值的光致发光发射的下降归因于量子限制的斯塔克效应。对于x = 0.23的Mg含量,提取了630kV / cm的内置电场,导致了激子结合能的降低和SQW发射的快速热猝灭,其活化能为(24±4 d_w = 8.3 nm的meV

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  • 来源
    《Journal of Applied Physics》 |2012年第11期|p.113504.1-113504.7|共7页
  • 作者单位

    Walter Schottky Institut and Physics Department, Technische Universitaet Muenchen, Am Coulombwall 4, 85748 Garching, Germany,I. Physikalisches Institut, Justus-Liebig-Universitat Giessen, Heinrich-Buff-Ring 16, 35392 Giessen, Germany;

    Walter Schottky Institut and Physics Department, Technische Universitaet Muenchen, Am Coulombwall 4, 85748 Garching, Germany;

    Walter Schottky Institut and Physics Department, Technische Universitaet Muenchen, Am Coulombwall 4, 85748 Garching, Germany;

    Walter Schottky Institut and Physics Department, Technische Universitaet Muenchen, Am Coulombwall 4, 85748 Garching, Germany;

    Institut fuer Physikalische Chemie, Justus-Liebig-Universitat Giessen, Heinrich-Buff-Ring 58, 35392 Giessen, Germany;

    I. Physikalisches Institut, Justus-Liebig-Universitat Giessen, Heinrich-Buff-Ring 16, 35392 Giessen, Germany;

    I. Physikalisches Institut, Justus-Liebig-Universitaet Giessen, Heinrich-Buff-Ring 16, 35392 Giessen, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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