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首页> 外文期刊>Journal of Applied Physics >Ultrafast carrier and coherent phonon dynamics in semi-insulated and n-type 4H-SiC
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Ultrafast carrier and coherent phonon dynamics in semi-insulated and n-type 4H-SiC

机译:半绝缘和n型4H-SiC中的超快载流子和相干声子动力学

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摘要

We investigated ultrafast carrier and phonon dynamics in semi-insulated (SI) and n-type 4H-SiC using time-resolved reflectivity measurements. In the n-type 4H-SiC, carriers are excited by an inter-conduction band transition, and thermalized by electron-electron scattering within 20 fs. We observed coherent phonons of folded phonon modes, which become Raman active as a result of the zone folding, and those of A_1-symmetry longitudinal optical (A_1-LO) phonon mode. In the n-type SiC, the A_1-LO coherent phonon forms a coupled mode with a plasmon, resulting in an asymmetrically broadened Fourier transform spectrum. The polarization dependence and the sine-type initial phase indicate that the impulsive stimulated Raman scattering is the mechanism generating coherent phonons of E_2-symmetry transverse optical and A_1-LO modes in both the SI and n-type 4H-SiC.
机译:我们使用时间分辨反射率测量技术研究了半绝缘(SI)和n型4H-SiC中超快的载流子和声子动力学。在n型4H-SiC中,载流子通过导带间跃迁被激发,并在20fs内通过电子-电子散射而被热化。我们观察到了折叠声子模式的相干声子,这些声子由于区域折叠而成为拉曼活性的,以及A_1对称纵向光学(A_1-LO)声子模式的相干声子。在n型SiC中,A_1-LO相干声子与等离激元形成耦合模,导致不对称扩宽的傅立叶变换谱。偏振相关性和正弦型初始相位表明,脉冲受激拉曼散射是在SI型和n型4H-SiC中均产生E_2对称横向光学和A_1-LO模式相干声子的机制。

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  • 来源
    《Journal of Applied Physics》 |2012年第11期|p.113520.1-113520.6|共6页
  • 作者单位

    NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation, 3-1 Morinosato Wakamiva, Atsugi, Kanagawa 243-0198, Japan;

    NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation, 3-1 Morinosato Wakamiva, Atsugi, Kanagawa 243-0198, Japan;

    NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation, 3-1 Morinosato Wakamiva, Atsugi, Kanagawa 243-0198, Japan;

    NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation, 3-1 Morinosato Wakamiva, Atsugi, Kanagawa 243-0198, Japan,Faculty of Science and Engineering, Toyo University;

    NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation, 3-1 Morinosato Wakamiva, Atsugi, Kanagawa 243-0198, Japan;

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  • 正文语种 eng
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