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Effects of matrix layer composition on the structural and optical properties of self-organized InGaN quantum dots

机译:基体层组成对自组织InGaN量子点结构和光学性质的影响

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摘要

Self-organized InGaN quantum dots (QDs) with emission wavelength from green to red range have been grown on GaN templated c-plane sapphire substrates by metal-organic chemical vapor deposition (MOCVD). The effects of matrix layer composition on the structural and optical properties of InGaN QDs have been investigated. A continued growth of QDs is observed during the growth of In_(0.1)Ga_(0.9)N matrix layer, which results in an increase of the QDs' size. By using In_(0.1)Ga_(0.9)N matrix layer instead of GaN one, the annealing induced blue-shift in emission energy of the InGaN QDs can be suppressed. After the growth of top GaN cap layer, a larger red-shift caused by the quantum confined Stark effect is observed in the sample with In_(0.1)Ga_(0.9)N matrix layer. Employing this method, InGaN QD sample emitting at 615 nm with an internal quantum efficiency of 24.3% has been grown. The significance of this method is that it allows a higher growth temperature of InGaN QDs with emission wavelength in the green range to improve the crystalline quality, which is beneficial to enhance the efficiency of green InGaN QD light-emitting-diodes and laser diodes.
机译:发射波长从绿色到红色范围的自组织InGaN量子点(QD)已通过金属有机化学气相沉积(MOCVD)在GaN模板化的c面蓝宝石衬底上生长。研究了基体层组成对InGaN QD的结构和光学性能的影响。在In_(0.1)Ga_(0.9)N基质层的生长过程中观察到QD的持续增长,这导致了QD尺寸的增加。通过使用In_(0.1)Ga_(0.9)N基体层代替GaN层,可以抑制InGaN QD的发射能量的退火引起的蓝移。在生长顶部GaN盖层之后,在具有In_(0.1)Ga_(0.9)N基体层的样品中观察到了由量子限制的Stark效应引起的更大的红移。使用这种方法,已经生长出内部量子效率为24.3%的615 nm发射的InGaN QD样品。此方法的意义在于,它可以使绿色波长范围内的InGaN QD的生长温度更高,从而改善晶体质量,这有利于增强绿色InGaN QD发光二极管和激光二极管的效率。

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  • 来源
    《Journal of Applied Physics》 |2013年第9期|093105.1-093105.6|共6页
  • 作者单位

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P. O. Box 912, Beijing 100083, China,Key Laboratory of Nanodevices and Applications, Chinese Academy of Sciences, Suzhou 215123, China,Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215123, China;

    Key Laboratory of Nanodevices and Applications, Chinese Academy of Sciences, Suzhou 215123, China,Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215123, China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P. O. Box 912, Beijing 100083, China,Key Laboratory of Nanodevices and Applications, Chinese Academy of Sciences, Suzhou 215123, China,Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215123, China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P. O. Box 912, Beijing 100083, China,Key Laboratory of Nanodevices and Applications, Chinese Academy of Sciences, Suzhou 215123, China,Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215123, China;

    Key Laboratory of Nanodevices and Applications, Chinese Academy of Sciences, Suzhou 215123, China,Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215123, China;

    Key Laboratory of Nanodevices and Applications, Chinese Academy of Sciences, Suzhou 215123, China,Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215123, China;

    Key Laboratory of Nanodevices and Applications, Chinese Academy of Sciences, Suzhou 215123, China,Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215123, China;

    Key Laboratory of Nanodevices and Applications, Chinese Academy of Sciences, Suzhou 215123, China,Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215123, China;

    Key Laboratory of Nanodevices and Applications, Chinese Academy of Sciences, Suzhou 215123, China,Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215123, China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P. O. Box 912, Beijing 100083, China;

    Key Laboratory of Nanodevices and Applications, Chinese Academy of Sciences, Suzhou 215123, China,Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215123, China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P. O. Box 912, Beijing 100083, China;

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