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首页> 外文期刊>Journal of Applied Physics >Temperature dependent carrier dynamics in telecommunication band InAs quantum dots and dashes grown on InP substrates
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Temperature dependent carrier dynamics in telecommunication band InAs quantum dots and dashes grown on InP substrates

机译:InP衬底上生长的电信频段InAs量子点和虚线中与温度相关的载流子动力学

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摘要

InAs quantum dots (QDs) grown on InP substrates can be used as light emitters in the telecommunication bands. In this paper, we present optical characterization of high-density circular quantum dots (QDots) grown on InP(311)B substrates and elongated dots (QDashes) grown on InP(OOl) substrates. We study the charge carrier transfer and luminescence thermal quenching mechanisms of the QDots and QDashes by investigating the temperature dependence of their time-integrated and time-resolved photoluminescence properties. This results in two different contributions of the thermal activation energies. The larger activation energies are attributed to the carrier escape to the barrier layer and the wetting layer (WL) from QDots and QDashes, respectively. The smaller activation energies are found to be originated from inter-dot/dash carrier transfer via coupled excited states. The variation of the average oscillator strength associated with the carrier re-distribution is discussed. The relation of the two activation energies is also quantitatively studied with the measurements of excited-state and ground-state energy separations. Finally, we show an approach to isolate individual quantum dots or dashes in a suitable nanostructure.
机译:在InP衬底上生长的InAs量子点(QD)可用作电信频段中的发光器。在本文中,我们介绍了在InP(311)B衬底上生长的高密度圆形量子点(QDots)和在InP(OOl)衬底上生长的细长点(QDashes)的光学表征。我们通过研究其时间积分和时间分辨的光致发光特性的温度依赖性,研究了QDots和QDash的电荷载流子转移和发光热猝灭机理。这导致热活化能的两种不同的贡献。较大的活化能归因于载流子分别从QDots和QDashes逸出到势垒层和湿润层(WL)。发现较小的活化能源自点/虚线载流子之间经由耦合的激发态的转移。讨论了与载波重新分配有关的平均振荡器强度的变化。还通过测量激发态和基态能量分离来定量研究两种活化能的关系。最后,我们展示了一种在合适的纳米结构中隔离单个量子点或破折号的方法。

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  • 来源
    《Journal of Applied Physics》 |2013年第3期|033506.1-033506.11|共11页
  • 作者单位

    Research Institute for Electronic Science, Hokkaido University, Sapporo 001-0021, Japan,Graduate School of Information Science and Technology, Hokkaido University, Sapporo 060-0814, Japan;

    Research Institute for Electronic Science, Hokkaido University, Sapporo 001-0021, Japan;

    Research Institute for Electronic Science, Hokkaido University, Sapporo 001-0021, Japan;

    Research Institute for Electronic Science, Hokkaido University, Sapporo 001-0021, Japan;

    Center for High Technology Materials, University of New Mexico, 1313 Goddard SE Albuquerque, New Mexico 87106, USA;

    Center for High Technology Materials, University of New Mexico, 1313 Goddard SE Albuquerque, New Mexico 87106, USA;

    Center for High Technology Materials, University of New Mexico, 1313 Goddard SE Albuquerque, New Mexico 87106, USA;

    National Institute of Information and Communications Technology, Koganei, Tokyo 184-8795, Japan;

    National Institute of Information and Communications Technology, Koganei, Tokyo 184-8795, Japan;

    Research Institute for Electronic Science, Hokkaido University, Sapporo 001-0021, Japan;

    Research Institute for Electronic Science, Hokkaido University, Sapporo 001-0021, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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