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机译:低ka-SiO_xC_y:H / a-SiC_xN_y:H界面的价和导带偏移
Logic Technology Development, Intel Corporation, Hillsboro, Oregon 97124, USA;
Logic Technology Development, Intel Corporation, Hillsboro, Oregon 97124, USA;
Logic Technology Development, Intel Corporation, Hillsboro, Oregon 97124, USA;
Logic Technology Development, Intel Corporation, Hillsboro, Oregon 97124, USA;
Logic Technology Development, Intel Corporation, Hillsboro, Oregon 97124, USA;
Ocotillo Materials Laboratory, Intel Corporation, Chandler, Arizona 85248, USA;
机译:非晶态六方氮化硼与硅网络电介质的界面处的价和导带偏移
机译:非晶态六方氮化硼与硅网络电介质的界面处的价和导带偏移
机译:加氢非晶硅-碳/晶体硅界面的导电带和价带偏移通过电容技术
机译:底物取向对GaN和Aln薄膜的价带分离器和价带偏移的影响
机译:RPECVD制备的硅酸alloy合金的光谱研究:导带/价带偏移能和光学带隙的比较。
机译:X射线光电子能谱法测量β-Ga2O3/纤锌矿GaN异质结构的价带偏移
机译:用于光电和电气设备应用的BALN / GAN Syperointerface的近零价带和大导电带偏移
机译:au覆盖层对埋地CaF2 / si(111)界面价带偏移的影响。 (重新公布新的可用性信息)。