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EFFECTS OF SUBSTRATE ORIENTATION ON THE VALENCE BAND SPLITTINGS AND VALENCE BAND OFFSETS IN GaN AND AlN FILMS

机译:底物取向对GaN和Aln薄膜的价带分离器和价带偏移的影响

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We present a first-principles study of heteroepitaxial interfaces between GaN and both cubic as well as wurtzite AlN substrates oriented along main cubic or hexagonal directions and of stacking fault interfaces between cubic and wurtzite GaN. Our calculations show that all studied heterostructures are of type I. Valence band offsets for GaN/AlN are nearly independent of the substrate orientation and of the order of 0.8 eV. The valence and conduction band offsets for a stacking fault interface are predicted to be 40 meV and 175 meV, respectively.
机译:我们提出了一种沿着主立方体或六边形方向沿大立方或六边形方向定向的杂交界面的一项原则研究,以及沿着主立方或六边形方向,以及立方和紫立岩宫之间的堆叠故障界面。我们的计算表明,所有研究的异质结构都是I型。GaN / ALN的价带偏移几乎与基板取向几乎与底板取向和0.8eV的顺序不同。堆叠故障界面的价和导通带偏移分别预测为40 mev和175 emv。

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