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Carrier dynamics in Beryllium doped low-temperature-grown InGaAs/InAlAs

机译:铍掺杂低温生长的InGaAs / InAlAs中的载流子动力学

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摘要

The electron and hole dynamics in low-temperature-grown InGaAs/InAlAs multiple quantum well structures are studied by optical pump-probe transmission measurements for Beryllium (Be) doping levels between 3 × 10~(17)cm~(-3) and 4 × 10~(18)cm~(-3). We investigate electron dynamics in the limit cases of unsaturated and completely saturated electron trapping. By expanding a rate equation model in these limits, the details of carrier dynamics are revealed. Electrons are trapped by ionized arsenic antisites, whereas recombination occurs between trapped electrons and holes trapped by negatively charged Be dopants.
机译:通过光学泵浦探针传输测量了3×10〜(17)cm〜(-3)和4之间的铍(Be)掺杂水平,研究了低温生长的InGaAs / InAlAs多量子阱结构中的电子和空穴动力学。 ×10〜(18)厘米〜(-3)。我们在不饱和和完全饱和电子陷阱的极限情况下研究电子动力学。通过在这些范围内扩展速率方程模型,可以揭示载流子动力学的细节。电子被离子化的砷反离子俘获,而被俘获的电子与被带负电的Be掺杂物俘获的空穴之间发生重组。

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  • 来源
    《Journal of Applied Physics》 |2014年第17期|172103.1-172103.4|共4页
  • 作者单位

    Fraunhofer Institute for Telecommunications, Heinrich Hertz Institute, Einsteinufer 37,10587 Berlin, Germany;

    Fraunhofer Institute for Telecommunications, Heinrich Hertz Institute, Einsteinufer 37,10587 Berlin, Germany;

    Fraunhofer Institute for Telecommunications, Heinrich Hertz Institute, Einsteinufer 37,10587 Berlin, Germany;

    Fraunhofer Institute for Telecommunications, Heinrich Hertz Institute, Einsteinufer 37,10587 Berlin, Germany;

    Fraunhofer Institute for Telecommunications, Heinrich Hertz Institute, Einsteinufer 37,10587 Berlin, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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