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Charge movement in a GaN-based hetero-structure field effect transistor structure with carbon doped buffer under applied substrate bias

机译:GaN异质结构场效应晶体管结构中的电荷移动,在施加衬底偏置的情况下,碳掺杂的缓冲液

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摘要

Charge trapping and transport in the carbon doped GaN buffer of a GaN-based hetero-structure field effect transistor (HFET) has been investigated under both positive and negative substrate bias. Clear evidence of redistribution of charges in the carbon doped region by thermally generated holes is seen, with electron injection and capture observed during positive bias. Excellent agreement is found with simulations. It is shown that these effects are intrinsic to the carbon doped GaN and need to be controlled to provide reliable and efficient GaN-based power HFETs.
机译:已经研究了在正负衬底偏置下,GaN基异质结构场效应晶体管(HFET)的碳掺杂GaN缓冲区中的电荷俘获和传输。可以看到由热产生的空穴在碳掺杂区域中电荷重新分布的清晰证据,在正偏压期间观察到电子注入和俘获。通过仿真发现极好的一致性。结果表明,这些效应是碳掺杂GaN固有的,需要加以控制以提供可靠,高效的GaN基功率HFET。

著录项

  • 来源
    《Journal of Applied Physics》 |2015年第21期|215701.1-215701.4|共4页
  • 作者单位

    Center for Device Thermography and Reliability, H.H. Wills Physics Laboratory, University of Bristol, Bristol BS8 1TL, United Kingdom,IQE (Europe) Ltd., Pascal Close, St. Mellons, Cardiff CF3 0LW, United Kingdom;

    Center for Device Thermography and Reliability, H.H. Wills Physics Laboratory, University of Bristol, Bristol BS8 1TL, United Kingdom;

    Center for Device Thermography and Reliability, H.H. Wills Physics Laboratory, University of Bristol, Bristol BS8 1TL, United Kingdom;

    IQE (Europe) Ltd., Pascal Close, St. Mellons, Cardiff CF3 0LW, United Kingdom;

    Center for Device Thermography and Reliability, H.H. Wills Physics Laboratory, University of Bristol, Bristol BS8 1TL, United Kingdom;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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