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首页> 外文期刊>Journal of Applied Physics >Hydrogenated indium oxide window layers for high-efficiency Cu(In,Ga)Se_2 solar cells
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Hydrogenated indium oxide window layers for high-efficiency Cu(In,Ga)Se_2 solar cells

机译:用于高效Cu(In,Ga)Se_2太阳能电池的氢化氧化铟窗口层

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摘要

High mobility hydrogenated indium oxide is investigated as a transparent contact for thin film Cu(In,Ga)Se_2 (CIGS) solar cells. Hydrogen doping of In_2O_3 thin films is achieved by injection of H_2O water vapor or H_2 gas during the sputter process. As-deposited amorphous In_2O_3:H films exhibit a high electron mobility of ~50 cm~2/Vs at room temperature. A bulk hydrogen concentration of ~4 at. % was measured for both optimized H-2O and H_2-processed films, although the H_2O-derived film exhibits a doping gradient as detected by elastic recoil detection analysis. Amorphous IOH films are implemented as front contacts in CIGS based solar cells, and their performance is compared with the reference ZnO:Al electrodes. The most significant feature of IOH containing devices is an enhanced open circuit voltage (V_(OC)) of ~20 mV regardless of the doping approach, whereas the short circuit current and fill factor remain the same for the H_2O case or slightly decrease for H2. The overall power conversion efficiency is improved from 15.7% to 16.2% by substituting ZnO:Al with IOH (H_2O) as front contacts. Finally, stability tests of non-encapsulated solar cells in dry air at 80 ℃ and constant illumination for 500 h demonstrate a higher stability for IOH-containing devices.
机译:研究了高迁移率氢化氧化铟作为薄膜Cu(In,Ga)Se_2(CIGS)太阳能电池的透明触点。通过在溅射过程中注入H_2O水蒸气或H_2气体来实现In_2O_3薄膜的氢掺杂。沉积的非晶态In_2O_3:H薄膜在室温下具有〜50 cm〜2 / Vs的高电子迁移率。氢的总浓度为〜4 at。尽管通过弹性反冲检测分析检测到源自H_2O的膜表现出掺杂梯度,但是对于优化的H-2O膜和经H_2处理的膜均测量了%,尽管H_2O衍生的膜表现出掺杂梯度。非晶态IOH薄膜被用作基于CIGS的太阳能电池中的前触点,并将其性能与参考ZnO:Al电极进行了比较。包含IOH的器件的最显着特征是,无论采用何种掺杂方法,其开路电压(V_(OC))都提高了约20 mV,而对于H_2O情况,短路电流和填充因数保持不变,而对于H2 。用IOO(H_2O)代替ZnO:Al作为前触点,可以将整体功率转换效率从15.7%提高到16.2%。最后,未封装的太阳能电池在80℃的干燥空气中以及在500h的恒定光照下的稳定性测试表明,含IOH的器件具有更高的稳定性。

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  • 来源
    《Journal of Applied Physics 》 |2015年第20期| 205301.1-205301.7| 共7页
  • 作者单位

    Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, UEberlandstrasse 129, 8600 Duebendorf, Switzerland;

    Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, UEberlandstrasse 129, 8600 Duebendorf, Switzerland;

    Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, UEberlandstrasse 129, 8600 Duebendorf, Switzerland;

    Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, UEberlandstrasse 129, 8600 Duebendorf, Switzerland;

    Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, UEberlandstrasse 129, 8600 Duebendorf, Switzerland;

    Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, UEberlandstrasse 129, 8600 Duebendorf, Switzerland;

    Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, UEberlandstrasse 129, 8600 Duebendorf, Switzerland;

    ETH Zuerich, Swiss Federal Institute of Technology, Laboratory of Ion Beam Physics, Otto-Stern-Weg 5, 8093 Zuerich, Switzerland;

    Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, UEberlandstrasse 129, 8600 Duebendorf, Switzerland;

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