机译:调制脉冲功率磁控溅射能量沉积铜薄膜中的压力效应:整体等离子体模型和实验
Surface Engineering Laboratory, School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China;
Surface Engineering Laboratory, School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China;
Surface Engineering Laboratory, School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China;
Surface Engineering Laboratory, School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China;
机译:通过调制脉冲功率磁控溅射放电反应沉积化合物膜的整体等离子体模型
机译:调制脉冲功率磁控溅射沉积Cu / Si(100)薄膜的划痕行为和有限元建模
机译:高功率脉冲磁控溅射和脉冲磁控溅射沉积氧化钇稳定的氧化锆薄膜
机译:倾斜靶在不同工作压力下大功率脉冲磁控溅射沉积AlN薄膜
机译:用于互连金属化的高功率脉冲磁控溅射和调制脉冲功率溅射的比较。
机译:大功率脉冲磁控溅射镍薄膜的斜角沉积
机译:大功率脉冲磁控溅射和脉冲磁控溅射沉积钇稳定的氧化锆薄膜