Electrical and structural properties of In-implanted Si_(1-x)Ge_x alloys

摘要

We report on the effects of dopant concentration and substrate stoichiometry on the electrical and structural properties of In-implanted Si_(1-x)Ge_x alloys. Correlating the fraction of electrically active In atoms from Hall Effect measurements with the In atomic environment determined by X-ray absorption spectroscopy, we observed the transition from electrically active, substitutional In at low In concentration to electrically inactive metallic In at high In concentration. The In solid-solubility limit has been quantified and was dependent on the Si_(1-x)Ge_x alloy stoichiometry; the solid-solubility limit increased as the Ge fraction increased. This result was consistent with density functional theory calculations of two In atoms in a Si_(1-x)Ge_x supercell that demonstrated that In-In pairing was energetically favorable for x approx＜ 0.7 and energetically unfavorable for x approx ＞0.7. Transmission electron microscopy imaging further complemented the results described earlier with the In concentration and Si_(1-x)Ge_x alloy stoichiometry dependencies readily visible. We have demonstrated that low resistivity values can be achieved with In implantation in Si_(1-x)Ge_x alloys, and this combination of dopant and substrate represents an effective doping protocol.