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Defect induced charge trapping in C-doped a-Al_2O_3

机译:缺陷诱导的C掺杂a-Al_2O_3中的电荷俘获

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摘要

The charged defect states of C-doped α-Al_2O_3 are investigated systematically with the density functional theory to study their thermodynamic stability and possible effects on the crystal structure and electrical conductivity. Our results reveal that under reducing (Al-rich) synthesis conditions, the most stable defect configuration is C_O~(-2) with a deep (-1|-2) thermodynamic transition level. As a result, C defects are expected to act as double acceptors by introducing appreciable deep electron traps in the host band gap of α-Al_2O_3. These results are consistent with the proposal that a large number of F~+-centers are formed as charge compensators to C_O~(-2)ions in α-Al_2O_3.
机译:利用密度泛函理论系统地研究了碳掺杂的α-Al_2O_3的带电缺陷态,以研究其热力学稳定性以及对晶体结构和导电性的可能影响。我们的结果表明,在还原(富铝)合成条件下,最稳定的缺陷构型是具有深(-1 | -2)热力学转变能级的C_O〜(-2)。结果,通过在α-Al_2O_3的主带隙中引入明显的深电子陷阱,预期C缺陷将充当双受体。这些结果与以下观点相一致:在α-Al_2O_3中形成大量的F〜+中心作为C_O〜(-2)离子的电荷补偿剂。

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  • 来源
    《Journal of Applied Physics》 |2017年第2期|025702.1-025702.4|共4页
  • 作者单位

    School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China,School of Materials Science and Engineering, University of New South Wales, Sydney 2052, Australia;

    School of Materials Science and Engineering, University of New South Wales, Sydney 2052, Australia;

    School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China;

    School of Materials Science and Engineering, University of New South Wales, Sydney 2052, Australia;

    School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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