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首页> 外文期刊>Journal of Applied Physics >van der Waals epitaxial ZnTe thin film on single-crystalline graphene
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van der Waals epitaxial ZnTe thin film on single-crystalline graphene

机译:单晶石墨烯上的Van der Waals外延ZnTe薄膜

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摘要

Graphene template has long been promoted as a promising host to support van der Waals flexible electronics. However, van der Waals epitaxial growth of conventional semiconductors in planar thin film form on transferred graphene sheets is challenging because the nucleation rate of film species on graphene is significantly low due to the passive surface of graphene. In this work, we demonstrate the epitaxy of zinc-blende ZnTe thin film on single-crystalline graphene supported by an amorphous glass substrate. Given the amorphous nature and no obvious remote epitaxy effect of the glass substrate, this study clearly proves the van der Waals epitaxy of a 3D semiconductor thin film on graphene. X-ray pole figure analysis reveals the existence of two ZnTe epitaxial orienta-tional domains on graphene, a strong X-ray intensity observed from the ZnTe [112] ‖ graphene [10] orientation domain, and a weaker intensity from the ZnTe [112] ‖ graphene [11] orientation domain. Furthermore, this study systematically investigates the optoelectronic properties of this epitaxial ZnTe film on graphene using temperature-dependent Raman spectroscopy, steady-state and time-resolved photoluminescence spectroscopy, and fabrication and characterization of a ZnTe-graphene photodetector. The research suggests an effective approach towards graphene-templated flexible electronics.
机译:长期以来,石墨烯模板已被推广为支持范德华柔性电子产品的有希望的宿主。然而,由于石墨烯的钝化表面,在石墨烯上的膜物质的成核速率非常低,在转移的石墨烯片上以平面薄膜形式的常规半导体的范德华外延生长是有挑战性的。在这项工作中,我们证明了由非晶玻璃衬底支撑的单晶石墨烯上的共混锌ZnTe薄膜的外延。考虑到玻璃基板的无定形性质和没有明显的远程外延效应,这项研究清楚地证明了石墨烯上的3D半导体薄膜的范德华外延。 X射线极图分析揭示了石墨烯上存在两个ZnTe外延取向域,从ZnTe [112]‖石墨烯[10]取向域观察到的X射线强度很强,而从ZnTe [112]取向域观察到的强度较弱。 ]‖石墨烯[11]取向域。此外,本研究使用温度依赖性拉曼光谱,稳态和时间分辨光致发光光谱以及ZnTe石墨烯光电探测器的制造和表征,系统地研究了石墨烯上外延ZnTe薄膜的光电性能。该研究提出了一种有效的方法来制备以石墨烯为模板的柔性电子产品。

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  • 来源
    《Journal of Applied Physics》 |2018年第2期|025303.1-025303.9|共9页
  • 作者单位

    Center for Materials, Devices and Integrated Systems and Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Center for Materials, Devices and Integrated Systems and Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Center for Materials, Devices and Integrated Systems and Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Center for Materials, Devices and Integrated Systems and Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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