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首页> 外文期刊>Japanese journal of applied physics >Precise determination of polarization fields in c-plane GaN/Al_xGa_(1-x)N/GaN heterostructures with capacitance-voltage-measurements
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Precise determination of polarization fields in c-plane GaN/Al_xGa_(1-x)N/GaN heterostructures with capacitance-voltage-measurements

机译:利用电容电压测量精确确定c面GaN / Al_xGa_(1-x)N / GaN异质结构中的极化场

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摘要

Due to changes in the spontaneous and piezoelectric polarization, AlGaN/GaN heterostructures exhibit strong polarization fields at heterointerfaces. For quantum wells, the polarization fields lead to a strong band bending and a redshift of the emission wavelength, known as quantum-confined Stark effect. In this paper the polarization fields of thin AlGaN layers in a GaN matrix were determined by evaluating the changes in the depletion region width in comparison to a reference sample without heterostructure using capacitance-voltage-measurements. The polarization fields for Al0.09Ga0.91N (0.6 +/- 0.7 MV cm(-1)), Al0.26Ga0.74N (2.3 +/- 0.6 MV cm(-1)), Al0.34Ga0.66N (3.1 +/- 0.6 MV cm(-1)), Al0.41Ga0.59N (4.0 +/- 0.7 MV cm(-1)) and Al0.47Ga0.53N (5.0 +/- 0.8 MV cm(-1)) heterostructures were determined. The results of the field strength and field direction of all samples are in excellent agreement with values predicted by theory and a capacitance-voltage based Poisson-carrier transport simulation approach giving experimental evidence for a nonlinear increasing polarization field with Al-concentration. (C) 2019 The Japan Society of Applied Physics
机译:由于自发极化和压电极化的变化,AlGaN / GaN异质结构在异质界面处显示出很强的极化场。对于量子阱,偏振场会导致强的能带弯曲和发射波长的红移,这称为量子限制斯塔克效应。在本文中,通过使用电容-电压测量与无异质结构的参考样品相比,评估了耗尽区宽度的变化,从而确定了GaN矩阵中AlGaN薄层的极化场。 Al0.09Ga0.91N(0.6 +/- 0.7 MV cm(-1)),Al0.26Ga0.74N(2.3 +/- 0.6 MV cm(-1)),Al0.34Ga0.66N(3.1 + /-0.6 MV cm(-1)),Al0.41Ga0.59N(4.0 +/- 0.7 MV cm(-1))和Al0.47Ga0.53N(5.0 +/- 0.8 MV cm(-1))异质结构决心。所有样品的场强和场方向的结果与理论预测的值和基于电容电压的泊松载流子传输模拟方法的预测值都非常吻合,这为随着Al浓度非线性增加的极化场提供了实验证据。 (C)2019日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2019年第sc期|SCCB08.1-SCCB08.6|共6页
  • 作者单位

    Tech Univ Berlin, Inst Solid State Phys, Hardenbergstr 36, Berlin, Germany;

    Tech Univ Berlin, Inst Solid State Phys, Hardenbergstr 36, Berlin, Germany;

    Tech Univ Berlin, Inst Opt & Atom Phys, Hardenbergstr 36, Berlin, Germany;

    KAUST, Adv Semicond Lab, Thuwal 23955, Saudi Arabia;

    KAUST, Adv Semicond Lab, Thuwal 23955, Saudi Arabia;

    Univ Kassel, Computat Elect & Photon Grp, Kassel, Germany|CINSaT, Kassel, Germany;

    Tech Univ Berlin, Inst Solid State Phys, Hardenbergstr 36, Berlin, Germany;

    Tech Univ Berlin, Inst Solid State Phys, Hardenbergstr 36, Berlin, Germany;

    Tech Univ Berlin, Inst Solid State Phys, Hardenbergstr 36, Berlin, Germany;

    Tech Univ Berlin, Inst Solid State Phys, Hardenbergstr 36, Berlin, Germany;

    Tech Univ Berlin, Inst Solid State Phys, Hardenbergstr 36, Berlin, Germany;

    Tech Univ Berlin, Inst Solid State Phys, Hardenbergstr 36, Berlin, Germany;

    Tech Univ Berlin, Inst Opt & Atom Phys, Hardenbergstr 36, Berlin, Germany;

    Tech Univ Berlin, Inst Opt & Atom Phys, Hardenbergstr 36, Berlin, Germany;

    Tech Univ Berlin, Inst Solid State Phys, Hardenbergstr 36, Berlin, Germany;

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