首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes >Improvement of Deposition Rate by Sandblasting of Tungsten Wire in Catalytic Chemical Vapor Deposition
【24h】

Improvement of Deposition Rate by Sandblasting of Tungsten Wire in Catalytic Chemical Vapor Deposition

机译:催化化学气相沉积中钨丝喷砂处理提高沉积速率

获取原文
获取原文并翻译 | 示例
           

摘要

The effects of sandblasting of tungsten wires were investigated to increase the deposition rate in catalytic chemical vapor deposition (Cat-CVD). The tungsten wires were sandblasted using silicon carbide powder. Both the surface area and surface roughness increased by this treatment. The deposition rate increased with the surface roughness when the input electric power was kept constant.
机译:研究了喷砂处理钨丝的效果,以提高催化化学气相沉积(Cat-CVD)中的沉积速率。使用碳化硅粉末对钨丝进行喷砂处理。通过该处理,表面积和表面粗糙度均增加。当输入功率保持恒定时,沉积速率随表面粗糙度而增加。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号