首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Synthesis and Characterization of B_2O_3-Doped Zinc Oxide Thin Films Prepared via RF-Magnetron Sputtering
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Synthesis and Characterization of B_2O_3-Doped Zinc Oxide Thin Films Prepared via RF-Magnetron Sputtering

机译:射频磁控溅射制备B_2O_3掺杂氧化锌薄膜的合成与表征

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摘要

The effects of B_2O_3 addition on the crystal structure and morphological features of ZnO thin films prepared via RF-magnetron sputtering have been studied. Doping B_2O_3 into ZnO films resulted in a c-axis preferred orientation and facilitated the deposition process. The microstructures of the prepared films markedly varied with the amount of B_2O_3 doping and oxygen content during sputtering. The presence of B_2O_3 in the ZnO films played an important role in the transmission of light and resulted in enhanced transmission in the visible range. The band-gap energies of the B_2O_3-doped ZnO films significantly decreased as the B_2O_3 amount increased and the oxygen content decreased during sputtering.
机译:研究了B_2O_3的添加对射频磁控溅射制备的ZnO薄膜晶体结构和形貌特征的影响。将B_2O_3掺杂到ZnO薄膜中导致c轴优先取向并促进了沉积过程。制备的薄膜的微观结构随溅射过程中B_2O_3掺杂量和氧含量的变化而显着变化。 ZnO薄膜中B_2O_3的存在在光的透射中起着重要作用,并导致可见光范围内的透射增强。 B_2O_3掺杂的ZnO薄膜的带隙能随着溅射过程中B_2O_3含量的增加和氧含量的降低而显着降低。

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