Effect of Laser-Plasma X-Ray Irradiation on Crystallization of Amorphous Silicon Film by Excimer Laser Annealing

Naoto Matsuo; Kazuya Uejukkoku; Akira Heya; Sho Amano; Yasuyuki Takanashi; Shuji Miyamoto; Takayasu Mochizuki

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Effect of Laser-Plasma X-Ray Irradiation on Crystallization of Amorphous Silicon Film by Excimer Laser Annealing

机译：准分子激光退火对等离子X射线辐照对非晶硅膜结晶的影响

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The effect of laser plasma soft X-ray (LPX) irradiation on crystallization by excimer laser annealing (ELA) was investigated at low ELA energy densities. The crystalline fraction at energy densities of 50 and 60 mJ/cm~2 for LPX followed by ELA is nearly e

机译：在低ELA能量密度下研究了激光等离子体软X射线（LPX）辐射对受激准分子激光退火（ELA）结晶的影响。 LPX和ELA在能量密度分别为50和60 mJ / cm〜2时的晶体分数接近e

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《Japanese journal of applied physics》 |2007年第44期|1061-1063|共3页
作者
Naoto Matsuo; Kazuya Uejukkoku; Akira Heya; Sho Amano; Yasuyuki Takanashi; Shuji Miyamoto; Takayasu Mochizuki;
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正文语种 eng
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crystallization; laser plasma soft X-ray; excimer laser annealing; poly-Si; low-temperature process;

机译：结晶;激光等离子软X射线;准分子激光退火多晶硅低温过程;

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1. Monitoring explosive crystallization phenomenon of amorphous silicon thin films during short pulse duration XeF excimer laser annealing using real-time optical diagnostic measurements [J] . Chil-Chyuan Kuo, Wen-Chang Yeh, Jia-Bin Chen, Thin Solid Films . 2006,第4期

机译：使用实时光学诊断测量监测短脉冲持续时间XeF准分子激光退火过程中非晶硅薄膜的爆炸结晶现象
2. Electrochemical And Raman-scattering Characterizations Of Defectsin Polycrystalline Silicon Thin Films Formed By Excimer-laser Annealing,rnsolid-phase Crystallization, And Continuous-wave Laser Lateral Crystallization [J] . Kuninori Kitahara, Yasutaka Ohashi, Kenichi Yamamoto, Japanese journal of applied physics . 2009,第2期

机译：准分子激光退火，固相结晶和连续波激光横向结晶形成的多晶硅薄膜缺陷的电化学和拉曼散射表征
3. In situ excimer laser irradiation as cleaning tool for solid phase epitaxy of laser crystallized polycrystalline silicon thin films [J] . Ingmar Hoeger, Thomas Schmidt, Anja Landgraf, Physica status solidi . 2013,第12期

机译：原位准分子激光辐照作为激光结晶多晶硅薄膜固相外延的清洗工具
4. Molecular Dynamics Simulations of Nucleation and Crystallization Processes During Excimer-Laser Annealing of Amorphous Silicon on Glass [C] . T. Motooka, S. Munetoh, Lee Byoung Min, Symposium on Advanced Optical Processing of Materials; 20030422-20030423; San Francisco,CA; US . 2003

机译：玻璃上非晶硅准分子激光退火过程中成核和结晶过程的分子动力学模拟
5. Excimer-laser crystallization of amorphous silicon thin films [D] . Viatella, John Wade 1997

机译：非晶硅薄膜的准分子激光结晶
6. Large-Scale and Localized Laser Crystallization of Optically Thick Amorphous Silicon Films by Near-IR Femtosecond Pulses [O] . Kirill Bronnikov, Alexander Dostovalov, Artem Cherepakhin, 2020

机译：近红外Femtosecond脉冲的光学厚非晶硅膜的大规模和局部激光结晶
7. Excimer Laser Crystallization Processes of Amorphous Silicon Thin Films by Using Molecular-dynamics Simulations [O] . Shinji Munetoh, Xiao Yan Ping, Tomohiko Ogata, 2010

机译：采用分子动力学模拟通过分子动力学薄膜的准分子激光结晶过程
8. Excimer Laser Crystallization of Silicon Films: Artificially-Controlled Super Lateral Growth for Grain Boundary Location-Controlled and Single Crystal Island Materials for Thin Film Transistor Applications [R] . Im, J. S. , Sposili, R. S. 1998

机译：硅薄膜准分子激光晶化：用于薄膜晶体管应用的晶界限位和单晶岛材料的人工控制超横向生长

Effect of Laser-Plasma X-Ray Irradiation on Crystallization of Amorphous Silicon Film by Excimer Laser Annealing

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