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首页> 外文期刊>Japanese journal of applied physics >Enhancement of Electrical Conductance for Pentacene Thin Film Transistor by Controlling an Initial Layer-by-Layer Growth Mode Directly on SiO_2 Insulator
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Enhancement of Electrical Conductance for Pentacene Thin Film Transistor by Controlling an Initial Layer-by-Layer Growth Mode Directly on SiO_2 Insulator

机译:通过直接在SiO_2绝缘体上控制初始的逐层生长模式来增强并五苯薄膜晶体管的电导率

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摘要

Initial nucleation and growth of pentacene films on various pre-cleaning treated SiO_2 gate insulators were systematically examined by atomic force microscope. The performance of fabricated pentacene thin film transistor devices was found to be highly related to the initial film growth modes. In contrast to the film in the three-dimensional island-like growth mode on SiO_2 under an organic cleaning process, a layer-by-layer initial growth mode occurred on the SiO_2 insulator cleaned with ammonia solution which has shown much improved electrical properties of the thin film transistors. Field effect mobility of the thin film transistor devices could be achieved as high as 1.0 cm~2 V~(-1)s~(-1) on the bared SiO_2/Si substrate and the on/off ratio was over 10~6. The enhanced electrical conductance was further confirmed by an electrostatic force microscopic observation of quantized electrical potentials via charge-injection to the submonolayer pentacene islands with layer-by-layer growth mode.
机译:利用原子力显微镜系统地研究了并五苯薄膜在各种预清洗处理过的SiO_2栅绝缘体上的初始成核和生长。发现制造的并五苯薄膜晶体管器件的性能与初始膜生长模式高度相关。与在有机清洗过程中在SiO_2上的三维岛状生长模式的薄膜相反,在用氨水清洗的SiO_2绝缘子上出现了逐层的初始生长模式,这表明该膜的电性能大大提高。薄膜晶体管。在裸露的SiO_2 / Si衬底上,薄膜晶体管器件的场效应迁移率可以达到1.0 cm〜2 V〜(-1)s〜(-1),开/关比大于10〜6。通过以逐层生长模式通过电荷注入亚单层并五苯岛的电荷势的静电力显微镜观察,进一步证实了增强的电导率。

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  • 来源
    《Japanese journal of applied physics》 |2009年第4issue2期|731-734|共4页
  • 作者单位

    National Center for Nanoscience and Technology, No. 11, Beiyitiao Zhongguancun, Beijing 100190, China Graduate School of Chinese Academy of Sciences, Beijing 100049, China;

    Department of Physics, Tsinghua University, Beijing 100084, China;

    National Center for Nanoscience and Technology, No. 11, Beiyitiao Zhongguancun, Beijing 100190, China;

    National Center for Nanoscience and Technology, No. 11, Beiyitiao Zhongguancun, Beijing 100190, China;

    National Center for Nanoscience and Technology, No. 11, Beiyitiao Zhongguancun, Beijing 100190, China Graduate School of Chinese Academy of Sciences, Beijing 100049, China;

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