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首页> 外文期刊>Japanese journal of applied physics >Effect of Surface Energy on Pentacene Thin-Film Growth and Organic Thin Film Transistor Characteristics
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Effect of Surface Energy on Pentacene Thin-Film Growth and Organic Thin Film Transistor Characteristics

机译:表面能对并五苯薄膜生长和有机薄膜晶体管特性的影响

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摘要

In this study, we discuss pentacene-based organic thin films grown on a self-assembled monolayer (SAM)-treated dielectric with various functional groups and molecular lengths. The functional groups and molecular lengths on the dielectric surface were modified using a SAM treatment followed by ultra violet (UV) light exposure. Surface energy was used to observe the surface polarity variation during UV light exposure. After pentacene deposition, the growth modes of pentacene on surfaces with various surface characteristics were analyzed by atomic force microscope (AFM) and X-ray diffraction (XRD). The structure of pentacene growth on different surfaces with various surface characteristics was carefully examined. Organic thin film transistors fabricated with pentacene grown on various surfaces were characterized. When the polar components of surface energy were decreased, device mobility was increased from 0.04 to 0.21 cm~2 V~(-1) s~(-1) and the threshold voltage shifted from -13.55 to -3.2 V.
机译:在这项研究中,我们讨论了在具有各种官能团和分子长度的自组装单层(SAM)处理的电介质上生长的并五苯有机薄膜。介电表面上的官能团和分子长度使用SAM处理进行了修饰,然后进行了紫外线(UV)曝光。在紫外光照射下,使用表面能观察表面极性变化。并五苯沉积后,通过原子力显微镜(AFM)和X射线衍射(XRD)分析并五苯在具有各种表面特征的表面上的生长模式。仔细研究了并五苯在具有不同表面特性的不同表面上生长的结构。表征了在不同表面上生长并五苯的有机薄膜晶体管。当表面能的极性分量减小时,器件迁移率从0.04增加到0.21 cm〜2 V〜(-1)s〜(-1),阈值电压从-13.55变为-3.2V。

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  • 来源
    《Japanese journal of applied physics 》 |2009年第3issue1期| 125-130| 共6页
  • 作者

    Hsiao-Wen Zan; Cheng-Wei Chou;

  • 作者单位

    Department of Photonics and Display Institute, National Chiao Tung University,1001 Ta-Hsueh Rd., Hsinchu 300, Taiwan Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University,1001 Ta-Hsueh Rd., Hsinchu 300, Taiwan;

    Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University,1001 Ta-Hsueh Rd., Hsinchu 300, Taiwan;

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