...
首页> 外文期刊>Japanese journal of applied physics >Microstructure and Properties of a (Bi_(0.95)Na_(0.75)K_(0.15)Li_(0.05))_(0.5)Ba_(0.05)TiO_3 Ceramic Thick Film Prepared by Electrophoretic Deposition
【24h】

Microstructure and Properties of a (Bi_(0.95)Na_(0.75)K_(0.15)Li_(0.05))_(0.5)Ba_(0.05)TiO_3 Ceramic Thick Film Prepared by Electrophoretic Deposition

机译:电泳沉积制备(Bi_(0.95)Na_(0.75)K_(0.15)Li_(0.05))_(0.5)Ba_(0.05)TiO_3陶瓷厚膜的组织和性能

获取原文
获取原文并翻译 | 示例
           

摘要

The changes in the microstructure and properties of a (Bi_(0.95)Na_(0.75)k_(0.15)Li_(0.05))_(0.5)Ba_(0.05)TiO_3 (BNKLT-BT) ceramic film were investigated when the ceramic film was deposited with the addition of platelike SrTiO_3 (STO) via an electrophoretic deposition method. The platelike SrTiO_3 (STO) was used as a template for inducing grain growth with a preferential orientation of [001], and as a protective plate for restraining some elements in the film from evaporating under heat treatment. The SrTiO_3 templates were found to be an effective protective layer for restraining the evaporation of volatile elements when the templates are placed on the ceramic thick film. The STO/BNKLT-BT/STO/AgPd/Al_2O_3 samples were fabricated and heated at 1170℃ for 12h. They showed a [001]-oriented texture structure and better ferroelectric properties. The textured microstructure could be observed with the occurrence of grain growth around the templates. When the maximum E (E_(max)) was 150 kV/cm, the textured film showed a remanent polarization (P_r) of 9μC/cm~2, which was larger than that of the nontextured film. The piezoelectric strain constant (d_(33)*) derived from the slope of the strain curve was 62pm/V for the textured film, which was 1.5 times that of the nontextured film.
机译:研究了(Bi_(0.95)Na_(0.75)k_(0.15)Li_(0.05))_(0.5)Ba_(0.05)TiO_3(BNKLT-BT)陶瓷膜的微观结构和性能的变化。通过电泳沉积方法添加板状SrTiO_3(STO)进行沉积。板状SrTiO_3(STO)用作诱导晶粒生长的模板,其优先取向为[001],并用作保护膜,用于抑制薄膜中的某些元素在热处理后蒸发。当将SrTiO_3模板放置在陶瓷厚膜上时,SrTiO_3模板是抑制挥发性元素蒸发的有效保护层。制备了STO / BNKLT-BT / STO / AgPd / Al_2O_3样品,并在1170℃下加热12h。他们表现出[001]取向的织构和更好的铁电性能。可以观察到带有纹理的微观结构,并在模板周围出现晶粒长大。当最大E(E_(max))为150kV / cm时,织构膜的剩余极化强度(P_r)为9μC/ cm〜2,大于未织构的膜。由应变曲线的斜率得出的压电应变常数(d_(33)*)对于有纹理的薄膜为62 pm/V,是无纹理薄膜的1.5倍。

著录项

  • 来源
    《Japanese journal of applied physics》 |2010年第9issue1期|p.091101.1-091101.8|共8页
  • 作者单位

    Advanced Materials and Application Research Laboratory, Korea Electrotechnology Research Institute,28-1 Seongju-dong, Changwon 641-120, Korea National Core Research Center for Hybrid Materials Solution, Busan National University, Geumjeong-gu, Busan 609-735, Korea;

    rnAdvanced Materials and Application Research Laboratory, Korea Electrotechnology Research Institute,28-1 Seongju-dong, Changwon 641-120, Korea;

    rnAdvanced Materials and Application Research Laboratory, Korea Electrotechnology Research Institute,28-1 Seongju-dong, Changwon 641-120, Korea;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号