Gas Adsorption Properties of Fluorocarbon Thin Films Prepared Using Three Different Types of RF Magnetron Sputtering Systems

摘要

Fluorocarbon thin films were deposited onto a quartz crystal with a poly(tetrafluoroethylene) target using three different types of RF magnetron sputtering systems with strong, Weak, and unbalanced magnetic fields. The adsorption properties of these thin films for water, ethanol, acetone, acetaldehyde, toluene, and methyl salicylate were evaluated using the quartz crystal microbalance (QCM) method in order to characterize the surface properties of these thin films. These thin films have low sensitivities to non-polar solvents that contain methyl and aromatic groups, and high sensitivities to polar solvents that contain carbonyl and hydroxyl groups. Chemical structures, especially, polar moieties in these fluorocarbon thin films would affect the gas adsorption properties.