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首页> 外文期刊>Japanese journal of applied physics >Removal of Fluorinated Compound Gases by an Enhanced Methane Microwave Plasma Burner
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Removal of Fluorinated Compound Gases by an Enhanced Methane Microwave Plasma Burner

机译:增强型甲烷微波等离子体燃烧器脱除氟化物气体

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Removal of fluorinated compound (FC) gases was experimentally investigated for various gas mixture constituents by making use of an enhanced methane microwave plasma burner. Methane (CH_4) as a fuel was injected into the microwave plasma torch for generating an enlarged high-temperature plasma flame. A mixture of nitrogen and FC gases was introduced into the burner flame. Abatement experiments of FC gases were carried out in terms of destruction and removal efficiency (DRE). The plasma burner generated at 1.4kW microwave power and 15 liters per minute (Ipm) CH_4 achieved DREs > 99.9% for NF_3 in 400 Ipm nitrogen and SF_6 in 1201pm nitrogen. Also, the plasma burner removed 94.7% of CF4 concentration in 60 Ipm nitrogen. Eventually, the experimental results showed that the microwave plasma burner can significantly eliminate FCs from the semiconductor industries.
机译:通过使用增强的甲烷微波等离子燃烧器,对各种气体混合物成分的脱氟化合物(FC)气体进行了实验研究。将作为燃料的甲烷(CH_4)注入微波等离子体炬中,以产生更大的高温等离子体火焰。将氮气和FC气体的混合物引入燃烧器火焰。根据销毁和去除效率(DRE)进行了FC气体减排实验。以1.4kW微波功率和每分钟15升(Ipm)的CH_4产生的等离子燃烧器,对于在400 Ipm氮气中的NF_3和在1201pm氮气中的SF_6,实现的DRE> 99.9%。同样,等离子燃烧器在60 Ipm的氮气中去除了94.7%的CF4浓度。最终,实验结果表明,微波等离子体燃烧器可以显着消除半导体工业中的FC。

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  • 来源
    《Japanese journal of applied physics 》 |2010年第1issue1期| 017101.1-017101.6| 共6页
  • 作者单位

    Applied Technology Research Division, National Fusion Research Institute, 52 Eoun-dong, Yuseong-gu, Daejeon 305-333, Korea;

    Applied Technology Research Division, National Fusion Research Institute, 52 Eoun-dong, Yuseong-gu, Daejeon 305-333, Korea;

    Applied Technology Research Division, National Fusion Research Institute, 52 Eoun-dong, Yuseong-gu, Daejeon 305-333, Korea;

    Department of Molecular Science and Technology, Ajou University, San 5, Woncheon-dong, Youngtong-gu, Suwon 443-749, Korea;

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