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首页> 外文期刊>Japanese journal of applied physics >Effects of Interface Grading on Electronic States and Optical Transitions in GaSb Type-ll Quantum Dots in GaAs
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Effects of Interface Grading on Electronic States and Optical Transitions in GaSb Type-ll Quantum Dots in GaAs

机译:界面分级对GaAs中GaSb II型量子点电子态和光学跃迁的影响

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摘要

Electronic states in type-ll GaSb quantum dots (QDs) in GaAs are studied theoretically and compared with experiments to clarify how the spatial overlap of holes in the dot and electrons outside is affected by the interface grading caused by the interdiffusion of Sb and As. Cone-shaped QDs with the initial size of 6 nm height and 20 nm radius are analyzed. The wavefunctions of electrons and holes and their overlap Θ are calculated. In an initial stage of grading, when the grading length L_g is below 1.2 nm, the mixing occurs only near the dot/matrix interface, leading to a decrease in Θ, since holes are squeezed into a smaller volume whereas electrons are more repelled by the dot. In later stages where L_g exceeds 1.2 nm, however, the hole confinement and the electron repulsion by the dot both weaken, leading to an increase in Θ; this accounts for a recent finding that the annealing of GaSb QDs induces a blue shift and an intensity increase in photoluminescence spectra.
机译:理论上研究了GaAs中II型GaSb量子点(QDs)中的电子态,并与实验进行了比较,以阐明Sb和As互扩散引起的界面渐变如何影响点中空穴与外部电子的空间重叠。分析初始大小为6 nm高,半径为20 nm的圆锥形量子点。计算电子和空穴的波函数及其重叠θ。在渐变的初始阶段,当渐变长度L_g低于1.2 nm时,混合仅发生在点/矩阵界面附近,从而导致θ减小,这是因为空穴被压缩为较小的体积,而电子被纳米颗粒排斥的程度更大。点。然而,在随后的阶段中,L_g超过1.2nm,空穴限制和由点引起的电子排斥都减弱,导致Θ增加;这说明了最近的发现,即GaSb QD的退火会引起蓝移和光致发光光谱强度的增加。

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  • 来源
    《Japanese journal of applied physics》 |2011年第4issue2期|p.04DJ06.1-04DJ06.4|共4页
  • 作者

    Takuya Kawazu; Hiroyuki Sakaki;

  • 作者单位

    National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan;

    National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan,Toyota Technological Institute, 2-12-1 Hisakata, Tempaku-ku, Nagoya 468-8511, Japan;

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