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Mid Wavelength Type Ⅱ InAs/GaSb Superlattice Photodetector Using SiO_xN_y Passivation

机译:SiO_xN_y钝化的中波长Ⅱ型InAs / GaSb超晶格光电探测器

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摘要

We report on a mid wavelength (MW) type Ⅱ InAs/GaSb superlattice (SL) photodetector structure using SiO_xN_y as the passivation material. The 50% cutoff wavelength of the photoresponse is 4.8 nm at 77 K. R_0A, the resistance-and-area product at zero bias, is 2.1 × 10~3Ω·cm~2 for the device with the SiO_xN_y passivation, which is about 13 times larger than that without the passivation. Our result indicates SiO_xN_y passivation is an effective way to reduce the shunt current for MW InAs/GaSb SL photodetector.
机译:我们报道了使用SiO_xN_y作为钝化材料的中波长(MW)Ⅱ型InAs / GaSb超晶格(SL)光电探测器结构。光响应的50%截止波长在77 K时为4.8 nm。对于具有SiO_xN_y钝化的器件,在零偏压下的电阻和面积积R_0A为2.1×10〜3Ω·cm〜2。倍于没有钝化的情况。我们的结果表明,SiO_xN_y钝化是降低MW InAs / GaSb SL光电探测器分流电流的有效方法。

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  • 来源
    《Japanese journal of applied physics》 |2012年第7issue1期|p.074002.1-074002.3|共3页
  • 作者单位

    Laboratory of Nano-Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;

    Laboratory of Nano-Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;

    Laboratory of Nano-Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;

    Laboratory of Nano-Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;

    Laboratory of Nano-Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;

    Laboratory of Nano-Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;

    Department of Basic Research and Development, Kunming Institute of Physics, Kunming 650023, China;

    Department of Basic Research and Development, Kunming Institute of Physics, Kunming 650023, China;

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  • 正文语种 eng
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