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Silica/Ultraviolet-Cured Resin Nanocomposites for Replica Molds in Ultraviolet Nanoimprinting

机译:硅胶/紫外线固化树脂纳米复合材料,用于紫外线纳米压印中的复制模具

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摘要

Fluid UV-curable composite resins made with methacrylate-modified silica nanoparticles (NPs), a diacrylate monomer, and a photoinitiator without nonreactive solvents were prepared to develop composite replica molds in UV nanoimprinting. 1,4-Bis(acryloyloxy)butane was compatible with NPs up to an inorganic silica component of 60 wt%, and its cured composite films showed a high transmittance of >89% at an Mine wavelength of 365 nm. The fluorinated antisticking layer obtained from an anlisticking reagent was formed effectively on a composite surface at which bare silica surfaces of NPs appeared by photooxidation of the composite film surface. Composite replica molds could be fabricated by putting a droplet of the composite resin on a silica substrate modified with a reactive adhesion layer, filling cavities of a fluorinated master mold with the resin under a pentafluoropropane (PFP) atmosphere, curing the molded resin by exposure to UV light, and treating the surface of the cured resin with the antisticking reagent after demolding. It was confirmed that the composite replica molds were available for step-and-repeat UV nanoimprinting using an acrylate-type UV-curable resin in PFP. The composite replica molds showed remarkably smaller release energies than the replica mold without NPs.
机译:制备了由甲基丙烯酸酯改性的二氧化硅纳米粒子(NPs),二丙烯酸酯单体和不含非反应性溶剂的光引发剂制成的可流动的UV固化复合树脂,以开发用于UV纳米压印的复合复制模具。 1,4-双(丙烯酰氧基)丁烷与NPs相容,无机二氧化硅组分含量高达60 wt%,其固化的复合膜在365 nm的矿山波长下显示> 89%的高透射率。在复合表面上有效地形成了由抗静电剂获得的氟化防粘层,在该复合表面上,通过复合膜表面的光氧化作用出现了NPs裸露的二氧化硅表面。可以通过以下方式制造复合复制品模具:将复合树脂的液滴放在经过反应性粘合层改性的二氧化硅基板上,在五氟丙烷(PFP)气氛下用树脂填充氟化主模具的型腔,并通过暴露于固化的方式固化成型的树脂。紫外线,脱模后用防粘剂处理固化树脂的表面。可以确认,该复合复制品模具可用于在PFP中使用丙烯酸酯类UV固化树脂进行分步重复的UV纳米压印。与没有NP的复制品模具相比,复合复制品模具的脱模能量要小得多。

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  • 来源
    《Japanese journal of applied physics》 |2012年第6issue2期|p.06FJ04.1-06FJ04.7|共7页
  • 作者单位

    Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan CREST, JST, Chiyoda, Tokyo 102-0075, Japan;

    Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan;

    Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan;

    Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan CREST, JST, Chiyoda, Tokyo 102-0075, Japan;

    Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan CREST, JST, Chiyoda, Tokyo 102-0075, Japan;

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