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Epitaxy of Graphene on 3C-SiC(111) Thin Films on Microfabricated Si(111) Substrates

机译:微细加工的Si(111)基底上3C-SiC(111)薄膜上石墨烯的外延

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摘要

The epitaxy of graphene on 3C-SiC(111) formed on microfabricated Si(111) has been demonstrated. Through observations by optical microscopy, micro-Raman spectroscopy, low-energy electron diffraction, and photoelectron spectroscopy, it has been confirmed that the epitaxial graphene is Bernal-stacked with a buffer layer present between graphene and the 3C-SIC film, which can lead to the opening of the band gap necessary for logic operations. The quality of graphene is improved by the shrinkage of the pattern. These results indicate that graphene on silicon using the microfabricated substrate is a promising material for the realization of graphene-based devices.
机译:已经证明了在微细加工的Si(111)上形成的3C-SiC(111)上石墨烯的外延。通过光学显微镜,显微拉曼光谱,低能电子衍射和光电子光谱的观察,已确认外延石墨烯是贝尔纳尔堆叠的,在石墨烯和3C-SIC膜之间存在缓冲层,这可能导致到逻辑运算所需的带隙开口。图案的收缩改善了石墨烯的质量。这些结果表明,使用微细加工的衬底在硅上的石墨烯是实现基于石墨烯的器件的有前途的材料。

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  • 来源
    《Japanese journal of applied physics》 |2012年第6issue2期|p.06FD02.1-06FD02.4|共4页
  • 作者单位

    Research Institute of Electrical Communications, Tohoku University, Sendai 980-8577, Japan;

    Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan;

    Research Institute of Electrical Communications, Tohoku University, Sendai 980-8577, Japan;

    Research Institute of Electrical Communications, Tohoku University, Sendai 980-8577, Japan;

    JASRI/SPring-8, Sayo, Hyogo 679-5148, Japan;

    JASRI/SPring-8, Sayo, Hyogo 679-5148, Japan;

    Graduate School of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan;

    JASRI/SPring-8, Sayo, Hyogo 679-5148, Japan;

    Japan Atomic Energy Agency, Sayo, Hyogo 679-5148, Japan;

    Japan Atomic Energy Agency, Sayo, Hyogo 679-5148, Japan;

    Research Institute of Electrical Communications, Tohoku University, Sendai 980-8577, Japan;

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