机译:微细加工的Si(111)基底上3C-SiC(111)薄膜上石墨烯的外延
Research Institute of Electrical Communications, Tohoku University, Sendai 980-8577, Japan;
Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan;
Research Institute of Electrical Communications, Tohoku University, Sendai 980-8577, Japan;
Research Institute of Electrical Communications, Tohoku University, Sendai 980-8577, Japan;
JASRI/SPring-8, Sayo, Hyogo 679-5148, Japan;
JASRI/SPring-8, Sayo, Hyogo 679-5148, Japan;
Graduate School of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan;
JASRI/SPring-8, Sayo, Hyogo 679-5148, Japan;
Japan Atomic Energy Agency, Sayo, Hyogo 679-5148, Japan;
Japan Atomic Energy Agency, Sayo, Hyogo 679-5148, Japan;
Research Institute of Electrical Communications, Tohoku University, Sendai 980-8577, Japan;
机译:在3C-SiC(111)/ Si(111)衬底上进行ZnO(002)薄膜的RF溅射,退火后处理和表征
机译:分子束外延生长在BaF_2(111)和SrF_2(111)衬底上的外延EuS(111)薄膜的特性
机译:Si(111)和SiC / Si(111)衬底上的GaN薄膜的等离子体辅助分子束外延:SiC和极性问题的影响
机译:在Si(111)基板上生长的3C-SiC膜作为石墨烯外延的模板
机译:使用常规和五极外延生长工艺在氢(6)-碳化硅(0001)和硅(111)衬底上生长氮化镓和氮化铝镓薄膜。
机译:在3C-SiC(111)/ Si(111)基板上进行ZnO(002)薄膜的RF溅射退火后处理和表征
机译:通过在Si(111),(110),(100)基材上的3C-SiC薄膜的热转化通过热转化石墨烯 - 硅形成