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机译:化学机械抛光垫槽型对浆料流动行为的影响
Department of Mechanical Engineering, Kyushu University, Fukuoka 819-0395, Japan;
Department of Mechanical Engineering, Kyushu University, Fukuoka 819-0395, Japan;
Department of Mechanical Engineering, Kyushu University, Fukuoka 819-0395, Japan,Department of Mechanical Engineering, Kanazawa Institute of Technology, Hakusan, Ishikawa 924-0838, Japan;
Department of Mechanical Engineering, Kyushu University, Fukuoka 819-0395, Japan;
Department of Mechanical Engineering, Kyushu University, Fukuoka 819-0395, Japan;
Department of Mechanical Engineering, Kyushu University, Fukuoka 819-0395, Japan;
Namiki Precision Jewel Co., Ltd., Adachi, Tokyo 123-8511, Japan;
机译:在化学机械平面化过程中,同心斜垫凹槽图案对浆料流动的影响
机译:十字图案抛光垫化学机械抛光不同浆料浓度下蓝宝石晶片的磨料去除深度研究
机译:具有同心凹槽垫图案几何形状的化学机械抛光(CMP)过程中氧化硅膜去除性能的分析和实验确认
机译:在高转速和低浆料流速下振动抛光焊盘的凹槽图案
机译:化学机械抛光中浆料流和材料去除的多尺度建模。
机译:浆料组成对金刚石薄膜化学机械抛光的影响
机译:难以处理材料的化学机械抛光中泥浆流动的研究