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Room-Temperature Fabrication of HfON Gate Insulator for Low-Voltage-Operating Pentacene-Based Organic Field-Effect Transistors

机译:用于低压操作并五苯的有机场效应晶体管的HfON栅极绝缘体的室温制造

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摘要

Low-voltage-operating pentacene-based organic field-effect transistors (OFETs) with different channel lengths have been fabricated by employing a room-temperature-processed HfON gate insulator. It was found that the on/off current ratio of the OFETs can be improved by decreasing the channel length. However, the hole mobility in the OFETs decreases with decreasing channel length owing to the effect of contact resistance. Interestingly, such OFETs with a short channel length (channel W/L = 500/50 μm) also show good electrical properties, such as a high hole mobility of 0.26 cm~2 V~(-1) s~(-1) a low subthreshold swing of 0.13 V/decade, and a large on/off current ratio of 1 × 10~5 at an operating voltage of -2V.
机译:已经通过采用室温处理的HfON栅极绝缘体来制造具有不同沟道长度的低电压并五苯基有机场效应晶体管(OFET)。已经发现,可以通过减小沟道长度来提高OFET的开/关电流比。然而,由于接触电阻的作用,OFET中的空穴迁移率随着沟道长度的减小而减小。有趣的是,这种具有短沟道长度的OFET(沟道W / L = 500/50μm)也显示出良好的电性能,例如0.26 cm〜2 V〜(-1)s〜(-1)a的高空穴迁移率。在-2V的工作电压下,亚阈值摆幅低至0.13 V /十倍,开/关电流比大(1×10〜5)。

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  • 来源
    《Japanese journal of applied physics》 |2012年第4issue2期|p.04DK01.1-04DK01.4|共4页
  • 作者单位

    Department of Electronics and Applied Physics, Tokyo Institute of Technology, Yokohama 226-8502, Japan;

    Department of Physics, Division of Quantum Phases and Devices, Konkuk University, Seoul 143-701, Korea;

    Department of Electronics and Applied Physics, Tokyo Institute of Technology, Yokohama 226-8502, Japan;

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