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首页> 外文期刊>Japanese journal of applied physics >Bottom Electrode Modification of ZrO_2 Resistive Switching Memory Device with Au Nanodots
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Bottom Electrode Modification of ZrO_2 Resistive Switching Memory Device with Au Nanodots

机译:Au纳米点对ZrO_2电阻开关存储器件的底电极修饰

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摘要

The resistive switching properties of the ZrO_2 memory devices with bottom electrode modification by using Au nanodots are investigated in this study. The regular arrays of Au nanodots are fabricated on Pt bottom electrode by nanosphere lithography. Due to the tip of the Au nanodots on the Pt bottom electrode, it causes the higher electric field within the ZrO_2 film above the nanodots due to reduced effective film thickness and induces the localized conducting filaments easily. The operation parameters' variation for switching devices is, therefore, suppressed with lower operation voltage and resistance ratio. Long retention time (>10~6s) and stubborn nondestructive readout test (>10~4s) at room temperature and 150°C are also demonstrated in this device.
机译:在这项研究中,研究了通过使用金纳米点修饰底部电极的ZrO_2存储器件的电阻转换特性。通过纳米球光刻技术在铂的底部电极上制备了规则的金纳米点阵列。由于Pt底部电极上的Au纳米点的尖端,由于减小了有效膜厚度,它在纳米点上方的ZrO_2膜内引起了较高的电场,并易于诱发局部导电丝。因此,以较低的工作电压和电阻比抑制了开关设备的工作参数变化。该设备还证明了在室温和150°C下具有较长的保留时间(> 10〜6s)和顽固的无损读出测试(> 10〜4s)。

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  • 来源
    《Japanese journal of applied physics》 |2012年第2issue2期|p.02BJ04.1-02BJ04.4|共4页
  • 作者单位

    Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University, Hsinchu 300, Taiwan;

    Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 300, Taiwan;

    Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University, Hsinchu 300, Taiwan;

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