Basic Performance of a Logic Intellectual Property Compatible Embedded Dynamic Random Access Memory with Cylinder Capacitors in Low-k/Cu Back End on the Line Layers

摘要

We have confirmed the basic performance of a new logic intellectual property (IP) compatible (LIC) embedded dynamic random access memory (eDRAM) with cylinder capacitors in the low-k/Cu back end on the line (BEOL) layers. The LIC-eDRAM reduces the contact (CT) height, or essentially the RC delays due to the parasitic component to the contact. By circuit simulation, a 28-nm-node LIC-eDRAM with the reduced CT height controls the logic delay with △τ_d < 5% to that of 28-nm-node standard complementary metal oxide semiconductor (CMOS) logics, enabling us ensure the logic IP compatibility. This was confirmed also by a 40-nm-node LIC-eDRAM test-chip fabricated. The 40-nm-node inverter delays in the test-chip were controlled actually within △τ_d < 5%, referred to those of a pure-CMOS logic LSI. Meanwhile the retention time of the DRAM macro was in the range of milliseconds, which has no difference to that of a conventional eDRAM with a capacitor-on-bitline (COB) structure. The LIC-eDRAM is one type of BEOL memory on standard CMOS devices, and is sustainable for widening eDRAM applications combined with a variety of leading-edge CMOS logic IPs, especially beyond 28-nm-nodes.