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首页> 外文期刊>Japanese journal of applied physics >Electrical Characterization of Bilayer Graphene Formed by Hydrogen Intercalation of Monolayer Graphene on SiC(0001)
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Electrical Characterization of Bilayer Graphene Formed by Hydrogen Intercalation of Monolayer Graphene on SiC(0001)

机译:单层石墨烯在SiC(0001)上的氢嵌入形成的双层石墨烯的电学表征

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摘要

Quasi-free-standing bilayer graphene was grown by hydrogen intercalation of epitaxial monolayer graphene on SiC(0001). A larger size of stacking domains compared to that of epitaxial bilayer graphene grown on SiC(0001) was observed in a low-energy electron microscopy analysis of its morphology. By evaluating its electronic transport characteristics in top-gated devices, we found that the quasi-free-standing bilayer graphene is p-doped at zero-gate voltage. Further, an increase in mobility was found compared to that of epitaxial bilayer graphene. As a result of the higher mobility, Shubnikov-de Hass oscillations were observed. We attribute the improved quality of the quasi-free-standing bilayer graphene to its structural properties.
机译:通过外延单层石墨烯在SiC(0001)上的氢插入来生长拟自立式双层石墨烯。在其形态的低能电子显微镜分析中,观察到与在SiC(0001)上生长的外延双层石墨烯相比,其堆叠畴尺寸更大。通过评估其在顶部浇口器件中的电子传输特性,我们发现准自立式双层石墨烯在零栅极电压下被p掺杂。此外,与外延双层石墨烯相比,发现迁移率增加。由于较高的迁移率,观察到了Shubnikov-de Hass振荡。我们将准自支撑双层石墨烯的改进质量归因于其结构特性。

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  • 来源
    《Japanese journal of applied physics》 |2012年第2issue2期|p.02BN02.1-02BN02.3|共3页
  • 作者单位

    NTT Basic Research Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan;

    NTT Basic Research Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan;

    NTT Basic Research Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan;

    NTT Basic Research Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan;

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