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机译:Si_(1-x)Ge_x沟道P型场效应晶体管上的Si_(1-y)Ge_y或Ge_(1-z)Sn_z源极/漏极应力源:一项技术计算机辅助设计研究
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
机译:(001)张弛Si_(1-y)Ge_y上的应变Si /应变Si_(1-x)Ge_x双通道pMOSFET的沟道电荷的TCAD准备密度梯度计算
机译:热处理对松弛Si_(1-x)Ge_(x)(x
机译:在松弛的Si_(1-x)ge_x虚拟衬底上使用通过氧化形成的富含Ge的层在应变Si / si_(1-y)ge_y双通道上进行新制备
机译:应变Si /应变Si_(1-x)Ge_x / RelaxD Si_(1-Y)Ge_y PMOSFET的分析阈值电压模型