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首页> 外文期刊>Japanese journal of applied physics >Enhancement of piezoelectric properties of (100)-orientated BiFeO_3 films on (100)LaNiO_3/Si
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Enhancement of piezoelectric properties of (100)-orientated BiFeO_3 films on (100)LaNiO_3/Si

机译:在(100)LaNiO_3 / Si上增强(100)取向的BiFeO_3薄膜的压电性能

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摘要

The piezoelectric properties of (100)-orientated BiFeO_3 thin films grown on (100)LaNiO_3/SiO_2/(100)Si were investigated. 200-nm-thick LaNiO_3 and 250-nm-thick BiFeO_3 was deposited by the rf magnetron sputtering method and sol-gel method, respectively. The (100)-oriented BiFeO_3 films were distorted to the in-plane tensile direction owing to the low thermal expansion coefficient of the Si substrate. While no significant dependence of the in-plane lattice distortion on the dielectric and ferroelectric properties and d_(33,AFM) piezoelectric coefficient measured by scanning probe microscopy was observed, it was found that the e_(31,f) piezoelectric coefficient increases with increasing the lattice distortion. The maximum e_(31,f) and figure of merit (FOM) were -4.0 C/m and 14 GPa, respectively, which are comparable to those of epitaxially grown (100)BiFeO_3 films.
机译:研究了在(100)LaNiO_3 / SiO_2 /(100)Si上生长的(100)取向BiFeO_3薄膜的压电性能。通过射频磁控溅射法和溶胶-凝胶法分别沉积200 nm厚的LaNiO_3和250 nm厚的BiFeO_3。由于Si衬底的低热膨胀系数,使(100)取向的BiFeO_3膜在面内拉伸方向上变形。虽然没有观察到平面晶格畸变对介电和铁电性能以及通过扫描探针显微镜测得的d_(33,AFM)压电系数的显着依赖性,但发现e_(31,f)压电系数随增加而增加晶格畸变。最大e_(31,f)和品质因数(FOM)分别为-4.0 C / m和14 GPa,这与外延生长(100)BiFeO_3薄膜的可比性相当。

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  • 来源
    《Japanese journal of applied physics》 |2014年第9s期|09PA14.1-09PA14.4|共4页
  • 作者单位

    Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, Sakai 599-8531, Japan;

    Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, Sakai 599-8531, Japan;

    Technology Research Institute of Osaka Prefecture, Izumi, Osaka 594-1157, Japan;

    Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, Sakai 599-8531, Japan;

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