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Low-frequency noise in carbon nanotube network thin-film transistors

机译:碳纳米管网络薄膜晶体管中的低频噪声

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摘要

Bottom-gate single-walled carbon nanotube (SWCNT) network thin-film transistors (TFTs) are fabricated and their low-frequency noise characteristics evaluated. Clear 1/f (f: frequency) and I_(DS)~2 (I_(DS): drain current) dependences are observed in the drain current noise power densities. The A/R (A: noise coefficient and R: resistance) was proportional to L_G~(-2) (L_G: gate length). The experimental results for TFTs are discussed on the basis of Hooge's empirical law. A simple model is proposed to explain why the A/R in our TFTs are smaller than those reported in individual CNT field-effect transistors (FETs). These results demonstrate that the 1/f noise in SWCNT TFTs originates not with the CNT-CNT junctions but rather with the CNTs themselves.
机译:制作了底栅单壁碳纳米管(SWCNT)网络薄膜晶体管(TFT)并评估了其低频噪声特性。在漏极电流噪声功率密度中观察到明显的1 / f(f:频率)和I_(DS)〜2(I_(DS):漏极电流)相关性。 A / R(A:噪声系数,R:电阻)与L_G〜(-2)(L_G:栅极长度)成正比。根据Hooge的经验定律讨论了TFT的实验结果。提出了一个简单的模型来解释为什么我们的TFT中的A / R小于单个CNT场效应晶体管(FET)中报告的A / R。这些结果表明,SWCNT TFT中的1 / f噪声不是源自CNT-CNT结,而是源自CNT本身。

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  • 来源
    《Japanese journal of applied physics》 |2014年第9期|090302.1-090302.3|共3页
  • 作者

    Tomo Tanaka; Eiichi Sano;

  • 作者单位

    Research Center for Integrated Quantum Electronics, Hokkaido University, Sapporo 060-8628, Japan;

    Research Center for Integrated Quantum Electronics, Hokkaido University, Sapporo 060-8628, Japan;

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  • 正文语种 eng
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