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Simulation study of effect of heteroepitaxial growth on crystalline germanium heterojunction solar cell

机译:异质外延生长对晶体锗异质结太阳能电池影响的模拟研究

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摘要

The impact of crystalline silicon (c-Si) heteroepitaxial growth on a crystalline germanium (c-Ge) heterojunction solar cell has been investigated by numerical simulation. It is revealed that the defect state density of the c-Si heteroepitaxial growth layer does not significantly affect the conversion efficiency, in contrast to the case of a c-Si heterojunction solar cell. A valence band offset between the c-Ge and the c-Si heteroepitaxial growth layer prevents recombination at the defect states. On the other hand, interface defect states have a greater impact on the performance due to the weak built-in potential. From these results, reducing the effect of the interface defects is essential to improve the solar cell performance. Possible ways to reduce the effect of the interface defect states are also discussed. (C) 2015 The Japan Society of Applied Physics
机译:通过数值模拟研究了晶体硅(c-Si)异质外延生长对晶体锗(c-Ge)异质结太阳能电池的影响。揭示了与c-Si异质结太阳能电池的情况相比,c-Si异质外延生长层的缺陷状态密度没有显着影响转换效率。 c-Ge和c-Si异质外延生长层之间的价带偏移防止了在缺陷状态下的复合。另一方面,由于内置电位弱,界面缺陷状态对性能的影响更大。从这些结果来看,减少界面缺陷的影响对于改善太阳能电池性能至关重要。还讨论了减少界面缺陷状态影响的可能方法。 (C)2015年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2015年第8s1期|08KB06.1-08KB06.5|共5页
  • 作者单位

    Mitsubishi Heavy Ind Co Ltd, Solar Power Dept, Nagasaki 8540065, Japan.;

    Mitsubishi Heavy Ind Co Ltd, Solar Power Dept, Nagasaki 8540065, Japan.;

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