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Crystalline structure of TiC ultrathin layers formed on highly oriented pyrolytic graphite by chemical reaction from Ti/graphite system

机译:通过Ti /石墨体系的化学反应在高取向热解石墨上形成的TiC超薄层的晶体结构

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We have investigated the atomic-scale reaction between a Ti thin layer and highly oriented pyrolytic graphite (HOPG) mainly by scanning tunneling microscopy. A deposited Ti layer shows an epitaxial orientation structure on a HOPG substrate even in room-temperature deposition, while the bonding between Ti and HOPG is very weak. The chemical reaction between Ti and HOPG takes place, and epitaxial TiC domains on HOPG are formed for annealing at above 600 degrees C. The TiC domains shows a smooth surface corresponding to the TiC(111) plane after annealing at 700 degrees C. The formation of TiC(001) facets and significant surface roughening of not only TiC but also HOPG substrates are observed for annealing at as high as 900 degrees C. (C) 2016 The Japan Society of Applied Physics
机译:我们主要通过扫描隧道显微镜研究了Ti薄层和高度取向的热解石墨(HOPG)之间的原子级反应。即使在室温下沉积,沉积的Ti层在HOPG衬底上也显示外延取向结构,而Ti和HOPG之间的结合非常弱。 Ti和HOPG之间发生化学反应,并在600℃以上的退火温度下形成HOPG上的外延TiC域。在700℃退火后,TiC域显示出与TiC(111)平面相对应的光滑表面。观察到TiC(001)刻面的磨损以及TiC以及HOPG衬底的显着表面粗糙化,可在高达900摄氏度的温度下进行退火。(C)2016年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2016年第6s3期|06JE02.1-06JE02.4|共4页
  • 作者单位

    Nagoya Univ, Grad Sch Engn, Dept Crystalline Mat Sci, Nagoya, Aichi 4648603, Japan;

    Nagoya Univ, Grad Sch Engn, Dept Crystalline Mat Sci, Nagoya, Aichi 4648603, Japan|DENSO Corp, Kota, Aichi 4440193, Japan;

    Nagoya Univ, Grad Sch Engn, Dept Crystalline Mat Sci, Nagoya, Aichi 4648603, Japan|IBM TJ Watson Res Ctr, New York, NY 10598 USA;

    Osaka Univ, Grad Sch Engn Sci, Toyonaka, Osaka 5608531, Japan;

    Nagoya Univ, Grad Sch Engn, Dept Crystalline Mat Sci, Nagoya, Aichi 4648603, Japan|Nagoya Univ, Inst Mat & Syst Sustainabil, Nagoya, Aichi 4648603, Japan;

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