Physical and electrical properties of induced high-k ZrHfO crystallization with ZrN cap by high power impulse magnetron sputtering for metal-gate metal-insulator-semiconductor structures

摘要

Metal-gate TiN/ZrN/ZrHfO/p-Si metal-insulator-semiconductor (MIS) structures have been fabricated in this work. The physical and electrical properties were characterized. The crystallization of high-k ZrHfO thin-film is induced by high power impulse magnetron sputtering (HIPIMS) during the deposition of ZrN capping layer. The binding energies and depth profiles were investigated by X-ray photoelectron spectroscopy (XPS). It is found that Zr and Hf out-diffusion from high-k dielectric in samples with HIPIMS is lesser than those in samples with the conventional DC magnetron sputtering (DCMS). The dielectric constant which strongly relates to the tetragonal phase becomes higher and the flatband voltage shift shows smaller by using the HIPIMS method than by the conventional DCMS. The cation and anion vacancies have been investigated by the defect reaction model. (C) 2017 The Japan Society of Applied Physics