Roles of chemical stoichiometry and hot electrons in realizing the stable resistive transition of sputter-deposited silicon oxide films

摘要

In this study, the important roles of chemical stoichiometry and hot electrons in realizing the stable bipolar resistive transition of sputter-deposited silicon oxide films were demonstrated. It was also clearly demonstrated that the injection of "hot" electrons from the silicon substrate induces stable resistive transitions for a low concentration of suboxide and metallic Si atoms, and that the injection of "cold" electrons from the silicon substrate does not induce stable resistive transitions in spite of the inclusion of metallic Si atoms in the oxide films. However, it was shown that the specific metal top electrode that does not react with oxygen ions is useful as the electron injector and temporal oxygen-ion pocket for the stable resistive transition of sputter-deposited silicon oxide films. (C) 2017 The Japan Society of Applied Physics.