...
首页> 外文期刊>ISIJ international >Effect of Initial Ni Plating on the Structure and Hardness of Electrodeposited Ni-W Alloys with and without Annealing
【24h】

Effect of Initial Ni Plating on the Structure and Hardness of Electrodeposited Ni-W Alloys with and without Annealing

机译:初始镀镍对有和无退火电沉积Ni-W合金组织和硬度的影响

获取原文
获取原文并翻译 | 示例

摘要

Ni-W alloys were electrodeposited onto steel sheets with an initial Ni plating. The electrodeposition was conducted in unagitated sulfate solution containing citric acid at pH 5 and 60℃ under coulostatic (9.0 × 10~5 C·m~(-2)) and galvanostatic (100-5 000 A·m~(-2)) conditions. The effect of the initial Ni plating on the structure and hardness of the deposited Ni-W alloys was investigated before and after annealing. At all current densities and in the presence and absence of the Ni plating, Ni_4W and NiW were precipitated in the annealed deposits. Without initial Ni plating, the Ni in the deposits diffused into the steel substrate during annealing, increasing the W content near the steel substrate. Consequently, many large precipitates were found in that vicinity. With initial Ni plating, the Ni in the plating diffused into the Ni-W deposits during annealing, and the W content of the deposits decreased around the plated Ni. The precipitates in the Ni-W deposits with initial Ni plating were finer than those without initial Ni plating. Before annealing, the W content in the deposits was lower in the initially Ni-plated sheet than in the unplated sheet. During annealing, Ni diffused from the plated Ni to the Ni-W deposits, apparently repressing the formation of large Ni_4W and NiW precipitates. The fine, uniformly deposited Ni_4W and NiW precipitates increased the hardness of the deposited Ni-W alloys after annealing.
机译:在初始镀镍的情况下,将Ni-W合金电沉积到钢板上。在pH为5和60℃的含柠檬酸的未搅拌硫酸盐溶液中,在静电压(9.0×10〜5 C·m〜(-2))和恒电流(100-5 000 A·m〜(-2))下进行电沉积。条件。在退火之前和之后,研究了初始镍镀层对沉积的镍-钨合金的组织和硬度的影响。在所有电流密度下,在有和没有镀镍的情况下,Ni_4W和NiW都会在退火的沉积物中沉淀出来。如果不进行最初的Ni镀覆,则在退火过程中,沉积物中的Ni扩散到钢基材中,从而增加了钢基材附近的W含量。因此,在该附近发现了许多大的沉淀物。通过初始的Ni镀层,镀层中的Ni在退火期间扩散到Ni-W沉积物中,并且沉积物的W含量在镀Ni周围周围降低。初始镀镍的Ni-W沉积物中的沉淀物比未进行初始镀镍的沉淀物细。在退火之前,沉积物中的W含量在最初的镍镀层中要比未镀层中的低。在退火过程中,Ni从电镀的Ni扩散到Ni-W沉积物中,显然抑制了大的Ni_4W和NiW沉淀物的形成。细小,均匀沉积的Ni_4W和NiW沉淀物增加了退火后沉积的Ni-W合金的硬度。

著录项

  • 来源
    《ISIJ international》 |2016年第6期|1048-1056|共9页
  • 作者单位

    Graduate School of Engineering, Kyushu University, 744, Motooka, Nishi-ku, Fukuoka-shi, 819-0395 Japan;

    Faculty of Engineering, Kyushu University, 744, Motooka, Nishi-ku, Fukuoka-shi, 819-0395 Japan;

    Graduate School of Engineering, Kyushu University, 744, Motooka, Nishi-ku, Fukuoka-shi, 819-0395 Japan,Hirohata R & D Lab. Nippon Steel & Sumitomo Metal, 1, Fuji-machi, Hirohata-ku, Himeji-shi, 671-1188 Japan;

    Faculty of Engineering, Kyushu University, 744, Motooka, Nishi-ku, Fukuoka-shi, 819-0395 Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    electrodeposition; Ni-W alloy; deposits; structure; hardness; annealing; Ni plating; precipitate;

    机译:电沉积镍钨合金;存款;结构体;硬度;退火;镀镍沉淀;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号