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首页> 外文期刊>ISIJ international >Effect of Initial Ni Plating on the Structure and Hardness of Electrodeposited Ni–W Alloys with and without Annealing
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Effect of Initial Ni Plating on the Structure and Hardness of Electrodeposited Ni–W Alloys with and without Annealing

机译:初始镀镍对有和无退火电沉积Ni-W合金组织和硬度的影响

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Ni–W alloys were electrodeposited onto steel sheets with an initial Ni plating. The electrodeposition was conducted in unagitated sulfate solution containing citric acid at pH 5 and 60°C under coulostatic (9.0 × 10~(5) C·m~(?2)) and galvanostatic (100–5000 A·m~(?2)) conditions. The effect of the initial Ni plating on the structure and hardness of the deposited Ni–W alloys was investigated before and after annealing. At all current densities and in the presence and absence of the Ni plating, Ni_(4)W and NiW were precipitated in the annealed deposits. Without initial Ni plating, the Ni in the deposits diffused into the steel substrate during annealing, increasing the W content near the steel substrate. Consequently, many large precipitates were found in that vicinity. With initial Ni plating, the Ni in the plating diffused into the Ni–W deposits during annealing, and the W content of the deposits decreased around the plated Ni. The precipitates in the Ni–W deposits with initial Ni plating were finer than those without initial Ni plating. Before annealing, the W content in the deposits was lower in the initially Ni-plated sheet than in the unplated sheet. During annealing, Ni diffused from the plated Ni to the Ni–W deposits, apparently repressing the formation of large Ni_(4)W and NiW precipitates. The fine, uniformly deposited Ni_(4)W and NiW precipitates increased the hardness of the deposited Ni–W alloys after annealing.
机译:将Ni–W合金电沉积到钢板上,并进行初始Ni镀层。电沉积是在pH 5和60°C的含柠檬酸的未搅拌硫酸盐溶液中进行的,该溶液的电容量为(9.0×10〜(5)C·m〜(?2)),恒电流(100–5000 A·m〜(?2) )) 条件。在退火之前和之后,研究了初始镍镀层对沉积的镍-钨合金的组织和硬度的影响。在所有电流密度下,在有和没有镀镍的情况下,Ni_(4)W和NiW都会在退火的沉积物中沉淀出来。如果没有初始的Ni镀层,则沉积物中的Ni在退火过程中会扩散到钢基材中,从而增加钢基材附近的W含量。因此,在该附近发现了许多大的沉淀物。初始镀镍后,镀层中的镍会在退火过程中扩散到Ni-W镀层中,镀层Ni周围的镀层中W含量降低。初始镀镍的Ni–W沉积物中的沉淀物比未进行初始镀镍的沉淀物细。在退火之前,沉积物中的W含量在最初的镍镀层中要比未镀层中的低。在退火过程中,Ni从镀镍扩散到Ni-W沉积物,显然抑制了较大的Ni_(4)W和NiW沉淀物的形成。细小,均匀沉积的Ni_(4)W和NiW沉淀物增加了退火后沉积的Ni–W合金的硬度。

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