Investigation of electrochromic tungsten trioxide thin films prepared by the ILGAR method

摘要

An ion layer gas reaction dip coating process for the deposition of tungsten trioxide has been developed. Thin films of electrochromic tungsten trioxide with thicknesses of up to 150 nm were prepared. The films were found to be microcrystalline by X-ray diffraction analysis. The growth rate of the films was measured by profilometry. The chemical diffusion coefficient of lithium was investigated as a function of the concentration of lithium by the electrochemical galvanostatic intermittent titration technique. The chemical diffusion coefficient $widetilde{D}$ was found to increase slightly from 7×10−12 to 3×10−1 cm2/s, with x increasing from 0.2 to 0.8 in Li x WO3.