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Microstructural study of thin films of 5 mol% gadolinia-doped ceria prepared by pulsed laser ablation

机译:脉冲激光烧蚀制备5 mol%氧化g掺杂二氧化铈薄膜的微观结构研究

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摘要

Microstructural characterization of thin films of 5 mol% gadolinia-doped ceria films deposited by pulsed laser ablation in the energy range 100–600 mJ/pulse has been investigated. As-deposited films were found to be nanocrystalline with preferred orientation. X-ray diffraction (XRD) analysis revealed that the size of the nanocrystals of doped ceria does not vary significantly with increasing laser energy, while transmission electron microscopy (TEM) study showed a uniform distribution of nanocrystals of 8–10 nm for energies ≤200 mJ/pulse and nanocrystals embedded in a large crystalline matrix of doped ceria for energies in the range 400–600 mJ/pulse. Though, the laser-ablated films were totally free from secondary phases, lattice imaging of the large grained doped ceria showed growth-induced defects such as dislocations and ledges.
机译:已经研究了在100-600 mJ / pulse的能量范围内通过脉冲激光烧蚀沉积的5 mol%掺杂氧化ado的氧化铈薄膜的薄膜的微观结构特征。发现沉积的膜是具有优选取向的纳米晶体。 X射线衍射(XRD)分析表明,掺杂二氧化铈的纳米晶体的尺寸不会随激光能量的增加而显着变化,而透射电子显微镜(TEM)研究表明,能量≤200时,纳米晶体的分布为8–10 nm。 mJ /脉冲和嵌入在掺杂二氧化铈大晶体基质中的纳米晶体,能量在400-600 mJ /脉冲范围内。虽然,激光烧蚀的薄膜完全没有第二相,但大颗粒掺杂二氧化铈的晶格成像显示出生长引起的缺陷,如位错和壁架。

著录项

  • 来源
    《Ionics》 |2007年第2期|87-92|共6页
  • 作者单位

    Department of Physics Anna University Chennai 600 025 India;

    Department of Physics Anna University Chennai 600 025 India;

    Materials Characterization Group Indira Gandhi Centre for Atomic Research Kalpakkam 603 102 India;

    Materials Characterization Group Indira Gandhi Centre for Atomic Research Kalpakkam 603 102 India;

    Materials Characterization Group Indira Gandhi Centre for Atomic Research Kalpakkam 603 102 India;

    Materials Characterization Group Indira Gandhi Centre for Atomic Research Kalpakkam 603 102 India;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Microstructure; Doped ceria; Laser ablation;

    机译:显微结构;掺杂二氧化铈;激光烧蚀;

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