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An equivalent-circuit modelling on vertical and horizontal integrations for MOS flat-band voltage simulation

机译:垂直和水平积分的等效电路建模,用于MOS平带电压仿真

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摘要

The fixed oxide charge will cause the MOS capacitor (MOS-C) flat-band voltage to shift. We can observe the potential distribution to determine the MOS-C flat-band voltage. However, the potential distribution can be obtained from the integration of the electric field distribution. The integration of the electric field distribution is classified into the vertical and horizontal integrations. In this paper, we use the equivalent-circuit model to demonstrate the flat-band voltage of the non-ideal MOS-C. The equivalent-circuit model of Poisson's equation includes two fixed charges Q′_(f1) and Q′_(f2) in the oxide layer region. Because the horizontal integration method is the superposition method, the equivalent-circuit model for the horizontal integration is divided into 3 types. Hence, the flat-band voltage for the horizontal integration is equal to the sum of the V_(G1), V_(G2), and V_(G3) for the flat-band condition. By comparison, the simulation results of the horizontal integration method approximate to the vertical integration method.
机译:固定的氧化物电荷将导致MOS电容器(MOS-C)的平带电压发生偏移。我们可以观察电势分布来确定MOS-C平带电压。然而,可以从电场分布的积分获得电势分布。电场分布的积分分为垂直积分和水平积分。在本文中,我们使用等效电路模型来演示非理想MOS-C的平带电压。泊松方程的等效电路模型在氧化物层区域包含两个固定电荷Q'_(f1)和Q'_(f2)。因为水平积分法是叠加法,所以用于水平积分的等效电路模型分为3种类型。因此,用于水平积分的平带电压等于用于平带条件的V_(G1),V_(G2)和V_(G3)之和。相比之下,水平积分法的仿真结果近似于垂直积分法。

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