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TISM for analysis of barriers affecting the adoption of lean concepts to electronics component manufacture

机译:影响影响精益概念对电子元件制造的障碍分析

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摘要

Purpose - The purpose of this paper is to present the analysis of barriers affecting the adoption of lean concepts to electrical and electronics component manufacturing. Design/methodology/approach - Lean concepts are being increasingly applied by electrical and electronics component manufacturers to enhance product value through streamlined process. To facilitate smooth adoption of lean concepts, barriers need to be analyzed and prioritized. In this context, a structural model of 24 barriers is developed through total interpretive structural modeling (TISM) approach. Findings - 'Changing governmental policies,' 'poor selection of change agents and improvement teams,' 'lack of top management commitment understanding and support of the system,' 'lack of team autonomy,' lack of flexibility and versatility' and 'lack of customer focus/involvement' are found to be the dominant barriers based on TISM study. Interpretation statements are being derived from TISM model. Cross-impact matrix multiplication applied to classification analysis is conducted. Research limitations/implications - In the present paper, 24 barriers are considered. In future, additional barriers could be considered to deal with managerial advancements. Practical implications - The paper reports the practical case of analysis of barriers to lean adoption in electronics component manufacture. Hence, the inferences have practical relevance. Originality/value - The development of structural model for the analysis of barriers to lean implementation in electronics component manufacturing small- and medium-sized enterprises is the original contribution of the authors.
机译:目的 - 本文的目的是展示影响通过精益概念对电气和电子元件制造的障碍的分析。设计/方法/方法 - 精益概念越来越多地应用于电气和电子元件制造商通过简化的过程来提高产品价值。为了促进顺利采用精益概念,需要分析和优先考虑障碍。在这种情况下,通过总解释性结构建模(TISM)方法开发了24个屏障的结构模型。调查结果 - “改变政府政策”,“改变代理商的选择不佳,”缺乏高层管理承诺理解和系统的支持“,”缺乏团队自治,灵活性和多功能性“和”缺乏“客户焦点/参与'被发现是基于TISM研究的主导障碍。解释陈述来自TISM模型。进行应用于分类分析的交叉冲击矩阵乘法。研究限制/影响 - 在本文中,考虑24个屏障。未来,可以考虑额外的障碍来处理管理进步。实际意义 - 论文报告了电子元件制造中贫瘠采用障碍分析的实际情况。因此,推论具有实际相关性。原创性/价值 - 电子部件制造中小企业精益实施障碍分析结构模型的发展是作者的原始贡献。

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