首页> 外文期刊>International journal of hydrogen energy >Pd/Mg/Pd thin films prepared by pulsed laser deposition under different helium pressures: Structure and electrochemical hydriding properties
【24h】

Pd/Mg/Pd thin films prepared by pulsed laser deposition under different helium pressures: Structure and electrochemical hydriding properties

机译:在不同氦气压力下通过脉冲激光沉积制备的Pd / Mg / Pd薄膜:结构和电化学氢化性能

获取原文
获取原文并翻译 | 示例
       

摘要

Three-layered Pd/Mg/Pd thin films were prepared by pulsed laser deposition in the presence of helium gas. For Pd layer deposition, the He pressure was fixed at 200 mTorr whereas different pressures of He were used for Mg layer deposition (50, 200 and 600 mTorr). The degree of crystallinity and of (001) texture in the Mg layer increase with increasing He pressure. In addition, the increase in He pressure upon Mg deposition greatly accentuates the roughness of the Mg layer, which induces an extension of the outer Pd/Mg interface region. In contrast, the inner Pd/Mg interface is sharp for all the Pd/Mg/Pd films. The electrochemical hydrogen sorption properties of the Pd/Mg/Pd films are improved by increasing the He pressure for Mg layer deposition. However, the maximum H-solubility in the Mg layer remains low (H/Mg ~ 0.26) and is not significantly increased by the presence of the inner Pd layer, indicating that Mg hydride phase is confined in the outer Pd/Mg interface region.
机译:在氦气存在下通过脉冲激光沉积制备三层Pd / Mg / Pd薄膜。对于Pd层沉积,He压力固定为200 mTorr,而将不同的He压力用于Mg层沉积(50、200和600 mTorr)。 Mg层的结晶度和(001)织构度随He压力的增加而增加。另外,在镁沉积时He压力的增加大大加重了镁层的粗糙度,这引起了外部Pd / Mg界面区域的扩展。相比之下,内部的Pd / Mg界面对于所有Pd / Mg / Pd薄膜而言都是清晰的。 Pd / Mg / Pd膜的电化学氢吸附性能可通过增加用于Mg层沉积的He压力来改善。但是,Mg层中的最大H溶解度仍然较低(H / Mg〜0.26),并且由于内部Pd层的存在而没有显着增加,表明Mg氢化物相被限制在外部Pd / Mg界面区域中。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号