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Hydrogen permeation through a Pd/Ta composite membrane with a HfN intermediate layer

机译:氢透过具有HfN中间层的Pd / Ta复合膜

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Dense hafnium nitride (HfN) layers were prepared between Pd protection films and a Ta substrate in a composite hydrogen separation membrane to prevent a reaction between the Pd and the substrate at high temperatures. No significant reduction in hydrogen permeation rate was observed for the membrane with 50-nm-thick HfN layers at 873 K through at least 35 h, whereas the specimen without HfN layers rapidly deteriorated within 5 h. Hydrogen permeability of the former specimen was 4 × 10 ~9molm ~1s ~1Pa ~(0.5)at 873K at steady state. This value was smaller than the initial permeability of Pd-covered Ta before deterioration by an order of magnitude. The measurements of pressure-composition isotherms by using a HfN powder specimen showed that the hydrogen solubility in HfN was sufficiently high and comparable with the solubility in Ta. Therefore, the low permeability observed with the HfN intermediate layers was ascribed to low hydrogen diffusivity in HfN.
机译:在复合氢分离膜中的Pd保护膜和Ta衬底之间制备了致密的氮化f(HfN)层,以防止Pd和衬底在高温下反应。至少在35 h内,在873 K处具有50 nm厚HfN层的膜的氢渗透速率没有观察到明显降低,而没有HfN层的样品在5 h内迅速劣化。在873K稳态下,前一个样品的氢渗透率为4×10〜9molm〜1s〜1Pa〜(0.5)。该值比劣化前Pd覆盖的Ta的初始磁导率小一个数量级。通过使用HfN粉末样品测量压力组成等温线表明,氢在HfN中的溶解度足够高,与在Ta中的溶解度相当。因此,在HfN中间层观察到的低渗透性归因于HfN中的低氢扩散率。

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